Introduction of helium into metals by magnetron sputtering deposition method

doi:10.1016/j.matlet.2004.13.008

IMR OpenIR

	Introduction of helium into metals by magnetron sputtering deposition method
	Zheng, H ; Liu, S ; Yu, HB ; Wang, LB ; Liu, CZ ; Shi, LQ
通讯作者	Zheng, H(zhenghua@imr.ac.cn)
	2005-04-01
发表期刊	MATERIALS LETTERS
ISSN	0167-577X
卷号	59 期号:8-9 页码:1071-1075
摘要	High concentration helium, up to 16 at.%, was introduced into Ti films through magnetron sputtering method in a He/Ar complex atmosphere. The introduced helium distributes homogeneously in the films and mainly forms small helium bubbles. Helium thermodesorption experiments were carried out, from which it was found that the thermodesorption properties of the introduced 4 He are similar to those of radiogenic He-3 in titanium tritides. Titanium alloy films containing helium were also prepared through this way and a comparison of thermodesorption properties was made between them and Ti-He films. (C) 2004 Elsevier B.V. All rights reserved.
关键词	helium Ti film magnetron sputtering thermodesorption
DOI	10.1016/j.matlet.2004.13.008
收录类别	SCI
语种	英语
WOS研究方向	Materials Science ; Physics
WOS类目	Materials Science, Multidisciplinary ; Physics, Applied
WOS记录号	WOS:000227164000048
出版者	ELSEVIER SCIENCE BV
引用统计
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/82513
通讯作者	Zheng, H
作者单位	1.Chinese Acad Sci, Inst Met Res, Shenyang 110016, Peoples R China 2.Fudan Univ, Inst Modern Phys, Shanghai 200433, Peoples R China
推荐引用方式 GB/T 7714	Zheng, H,Liu, S,Yu, HB,et al. Introduction of helium into metals by magnetron sputtering deposition method[J]. MATERIALS LETTERS,2005,59(8-9):1071-1075.
APA	Zheng, H,Liu, S,Yu, HB,Wang, LB,Liu, CZ,&Shi, LQ.(2005).Introduction of helium into metals by magnetron sputtering deposition method.MATERIALS LETTERS,59(8-9),1071-1075.
MLA	Zheng, H,et al."Introduction of helium into metals by magnetron sputtering deposition method".MATERIALS LETTERS 59.8-9(2005):1071-1075.