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Introduction of helium into metals by magnetron sputtering deposition method
Zheng, H; Liu, S; Yu, HB; Wang, LB; Liu, CZ; Shi, LQ
Corresponding AuthorZheng, H(zhenghua@imr.ac.cn)
2005-04-01
Source PublicationMATERIALS LETTERS
ISSN0167-577X
Volume59Issue:8-9Pages:1071-1075
AbstractHigh concentration helium, up to 16 at.%, was introduced into Ti films through magnetron sputtering method in a He/Ar complex atmosphere. The introduced helium distributes homogeneously in the films and mainly forms small helium bubbles. Helium thermodesorption experiments were carried out, from which it was found that the thermodesorption properties of the introduced 4 He are similar to those of radiogenic He-3 in titanium tritides. Titanium alloy films containing helium were also prepared through this way and a comparison of thermodesorption properties was made between them and Ti-He films. (C) 2004 Elsevier B.V. All rights reserved.
Keywordhelium Ti film magnetron sputtering thermodesorption
DOI10.1016/j.matlet.2004.13.008
Indexed BySCI
Language英语
WOS Research AreaMaterials Science ; Physics
WOS SubjectMaterials Science, Multidisciplinary ; Physics, Applied
WOS IDWOS:000227164000048
PublisherELSEVIER SCIENCE BV
Citation statistics
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/82513
Corresponding AuthorZheng, H
Affiliation1.Chinese Acad Sci, Inst Met Res, Shenyang 110016, Peoples R China
2.Fudan Univ, Inst Modern Phys, Shanghai 200433, Peoples R China
Recommended Citation
GB/T 7714
Zheng, H,Liu, S,Yu, HB,et al. Introduction of helium into metals by magnetron sputtering deposition method[J]. MATERIALS LETTERS,2005,59(8-9):1071-1075.
APA Zheng, H,Liu, S,Yu, HB,Wang, LB,Liu, CZ,&Shi, LQ.(2005).Introduction of helium into metals by magnetron sputtering deposition method.MATERIALS LETTERS,59(8-9),1071-1075.
MLA Zheng, H,et al."Introduction of helium into metals by magnetron sputtering deposition method".MATERIALS LETTERS 59.8-9(2005):1071-1075.
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