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Numerical analysis of spacial field in hot filament chemical vapor deposition diamond film
Li, JG; Liu, S; Li, YY; Hu, DP; Ji, XL; Mei, J; Zhou, D
通讯作者Li, JG(jiangli@imr.ac.cn)
2005-04-11
发表期刊ACTA METALLURGICA SINICA
ISSN0412-1961
卷号41期号:4页码:437-443
摘要Two-dimension coupled model of the temperature filed, velocity field and density field was developed according to the geometry and technology parameters in hot filament chemical vapor deposition (HFCVD) diamond film. The spacial field during large area diamond film deposition was simulated using this model to study the influence of deposited parameters. The calculated results about the temperature and the mass flow density on the substrate are consistent with experimented ones. The inlet gas velocity obviously affects the uniformity of the mass flow density, and the other deposited parameters have little influence on the distributions of the temperature and mass flow density. The optimal hot filament geometry parameters to deposit high quality diamond films with an area of 100 mm x 100 mm are gained on the basis of the minimum temperature along hot filament array.
关键词HFCVD coupled model spacial field simulation
收录类别SCI
语种英语
WOS研究方向Metallurgy & Metallurgical Engineering
WOS类目Metallurgy & Metallurgical Engineering
WOS记录号WOS:000228756900020
出版者SCIENCE CHINA PRESS
引用统计
被引频次:2[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.imr.ac.cn/handle/321006/82871
专题中国科学院金属研究所
通讯作者Li, JG
作者单位1.Chinese Acad Sci, Inst Met Res, Shenyang 110016, Peoples R China
2.China Acad Engn Phys, Inst Struct Mat, Mianyang 621900, Peoples R China
推荐引用方式
GB/T 7714
Li, JG,Liu, S,Li, YY,et al. Numerical analysis of spacial field in hot filament chemical vapor deposition diamond film[J]. ACTA METALLURGICA SINICA,2005,41(4):437-443.
APA Li, JG.,Liu, S.,Li, YY.,Hu, DP.,Ji, XL.,...&Zhou, D.(2005).Numerical analysis of spacial field in hot filament chemical vapor deposition diamond film.ACTA METALLURGICA SINICA,41(4),437-443.
MLA Li, JG,et al."Numerical analysis of spacial field in hot filament chemical vapor deposition diamond film".ACTA METALLURGICA SINICA 41.4(2005):437-443.
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