Experimental verification of the physical model for droplet-particles cleaning in pulsed bias arc ion plating

IMR OpenIR

	Experimental verification of the physical model for droplet-particles cleaning in pulsed bias arc ion plating
	Zhao, YH ; Lin, GQ ; Dong, C ; Wen, LS
通讯作者	Lin, GQ()
	2005-05-01
发表期刊	JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY
ISSN	1005-0302
卷号	21 期号:3 页码:423-426
摘要	It has been reported that application of pulsed biases in arc ion plating could effectively eliminate droplet particles. The present paper aims at experimental verification of a physical model proposed previously by us which is based on particle charging and repulsion in the pulsed plasma sheath. An orthogonal experiment was designed for this purpose, using the electrical parameters of the pulsed bias for the deposition of TiN films on stainless steel substrates. The effect of these parameters on the amount and the size distribution of the particles were analyzed, and the results provided sufficient evidence for the physical model.
关键词	arc ion plating pulsed bias TiN film droplet-particles
收录类别	SCI
语种	英语
WOS研究方向	Materials Science ; Metallurgy & Metallurgical Engineering
WOS类目	Materials Science, Multidisciplinary ; Metallurgy & Metallurgical Engineering
WOS记录号	WOS:000229594400029
出版者	JOURNAL MATER SCI TECHNOL
引用统计
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/83190
通讯作者	Lin, GQ
作者单位	1.Dalian Univ Technol, State Key Lab Mat Modificat Laser Ion & Electron, Dalian 116024, Peoples R China 2.Chinese Acad Sci, Inst Met Res, Shenyang 110016, Peoples R China
推荐引用方式 GB/T 7714	Zhao, YH,Lin, GQ,Dong, C,et al. Experimental verification of the physical model for droplet-particles cleaning in pulsed bias arc ion plating[J]. JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY,2005,21(3):423-426.
APA	Zhao, YH,Lin, GQ,Dong, C,&Wen, LS.(2005).Experimental verification of the physical model for droplet-particles cleaning in pulsed bias arc ion plating.JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY,21(3),423-426.
MLA	Zhao, YH,et al."Experimental verification of the physical model for droplet-particles cleaning in pulsed bias arc ion plating".JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY 21.3(2005):423-426.