Effect of pulsed bias on microhardness of Ti/TiN multilayer films deposited by arc ion plating

IMR OpenIR

	Effect of pulsed bias on microhardness of Ti/TiN multilayer films deposited by arc ion plating
	Zhao, YH ; Lin, GQ ; Li, XN ; Dong, C ; Wen, LS
通讯作者	Lin, GQ()
	2005-10-01
发表期刊	ACTA METALLURGICA SINICA
ISSN	0412-1961
卷号	41 期号:10 页码:1106-1110
摘要	Ti/TiN nano-multilayer films were deposited on high-speed-steel (HSS) substrates using arc ion plating, and orthogonal experiments were used to analyze the effects of the electrical parameters of pulsed bias on microhardness of Ti/TiN multilayer films. The results show that in all the pulsed bias related parameters (pulsed bias magnitude, duty ratio and frequency) and the geometry parameters (modulation period and period ratio), pulsed bias magnitude is the major factor affecting microhardness of the multilayer films. The maximum microhardness of 34.1 GPa was obtained with pulsed bias magnitude 900 V, duty ratio 50% and frequency 30 kHz, and the responding modulation period is 84 nm, the single layer thicknesses of TiN and Ti are 71 and 13 run, respectively. Due to the large single layer thickness, the nano-scale strengthening effect is not obviously manifested. The increase of the microhardness correlates mainly with refinement of microstructure resulted from the pulsed bias parameters especially the pulsed bias magnitude.
关键词	pulsed bias arc ion plating Ti/TiN nano-multilayer film microhardness
收录类别	SCI
语种	英语
WOS研究方向	Metallurgy & Metallurgical Engineering
WOS类目	Metallurgy & Metallurgical Engineering
WOS记录号	WOS:000233255700020
出版者	SCIENCE PRESS
引用统计	被引频次：4[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/83264
专题	中国科学院金属研究所
通讯作者	Lin, GQ
作者单位	1.Dalian Univ Technol, State Key Lab Mat Modificat Laser Ion & Electron, Dalian 116024, Peoples R China 2.Dalian Univ Technol, Dept Phys, Dalian 116024, Peoples R China 3.Chinese Acad Sci, Inst Met Res, Shenyang 110016, Peoples R China
推荐引用方式 GB/T 7714	Zhao, YH,Lin, GQ,Li, XN,et al. Effect of pulsed bias on microhardness of Ti/TiN multilayer films deposited by arc ion plating[J]. ACTA METALLURGICA SINICA,2005,41(10):1106-1110.
APA	Zhao, YH,Lin, GQ,Li, XN,Dong, C,&Wen, LS.(2005).Effect of pulsed bias on microhardness of Ti/TiN multilayer films deposited by arc ion plating.ACTA METALLURGICA SINICA,41(10),1106-1110.
MLA	Zhao, YH,et al."Effect of pulsed bias on microhardness of Ti/TiN multilayer films deposited by arc ion plating".ACTA METALLURGICA SINICA 41.10(2005):1106-1110.