Simulations of the dependence of gas physical parameters on deposition variables during HFCVD diamond films

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	Simulations of the dependence of gas physical parameters on deposition variables during HFCVD diamond films
	Wang, Aiying ; Lee, Kwangryeol ; Sun, Chao ; Wen, Lishi
通讯作者	Wang, Aiying(aywang@kist.re.kr)
	2006-09-01
发表期刊	JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY
ISSN	1005-0302
卷号	22 期号:5 页码:599-604
摘要	During the growth of the hot filament chemical vapor deposition (HFCVD) diamond films, numerical simulations in a 2-D mathematical model were employed to investigate the influence of various deposition parameters on the gas physical parameters, including the temperature, velocity and volume density of gas. It was found that, even in the case of optimized deposition parameters, the space distributions of gas parameters were heterogeneous due primarily to the thermal blockage come from the hot filaments and cryogenic pump effect arisen from the cold reactor wall. The distribution of volume density agreed well with the. thermal round-flow phenomenon, one of the key obstacles to obtaining high growth rate in HFCVD process. In virtue of isothermal boundary with high temperature or adiabatic boundary condition of reactor wall, however, the thermal round-flow was profoundly reduced and as a consequence, the uniformity of gas physical parameters was considerably improved, as identified by the experimental films growth.
关键词	gas physical parameters simulations diamond films HFCVD
收录类别	SCI
语种	英语
WOS研究方向	Materials Science ; Metallurgy & Metallurgical Engineering
WOS类目	Materials Science, Multidisciplinary ; Metallurgy & Metallurgical Engineering
WOS记录号	WOS:000241099400006
出版者	JOURNAL MATER SCI TECHNOL
引用统计	被引频次：12[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/86376
专题	中国科学院金属研究所
通讯作者	Wang, Aiying
作者单位	1.Korea Inst Sci & Technol, Future Technol Res Div, Seoul 130650, South Korea 2.J&L Tech Co Ltd, Plasma Lab, Sicheung 21857, Kyunggi Do, South Korea 3.Chinese Acad Sci, Met Res Inst, Dept Surface Engn Mat, Shenyang 110016, Peoples R China
推荐引用方式 GB/T 7714	Wang, Aiying,Lee, Kwangryeol,Sun, Chao,et al. Simulations of the dependence of gas physical parameters on deposition variables during HFCVD diamond films[J]. JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY,2006,22(5):599-604.
APA	Wang, Aiying,Lee, Kwangryeol,Sun, Chao,&Wen, Lishi.(2006).Simulations of the dependence of gas physical parameters on deposition variables during HFCVD diamond films.JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY,22(5),599-604.
MLA	Wang, Aiying,et al."Simulations of the dependence of gas physical parameters on deposition variables during HFCVD diamond films".JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY 22.5(2006):599-604.