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Nanoelectronic devices-resonant tunnelling diodes grown on InP substrates by molecular beam epitaxy with peak to valley current ratio of 17 at room temperature
Zhang, Y; Zeng, YP; Ma, L; Wang, BQ; Zhu, ZP; Wang, LC; Yang, FH
通讯作者Zhang, Y()
2006-06-01
发表期刊CHINESE PHYSICS
ISSN1009-1963
卷号15期号:6页码:1335-1338
摘要This paper reports that lnAs/In0.53Ga0.47As/AlAs resonant tunnelling diodes have been grown on InP substrates by molecular beam epitaxy. Peak to valley current ratio of these devices is 17 at 300K. A peak current density of 3kA/cm(2) has been obtained for diodes with AlAs barriers of ten monolayers, and an In0.53Ga0.47As well of eight monolayers with four monolayers of InAs insert layer. The effects of growth interruption for smoothing potential barrier interfaces have been investigated by high resolution transmission electron microscope.
关键词resonant tunnelling diode InP substrate molecular beam epitaxy high resolution transmission electron microscope
收录类别SCI
语种英语
WOS研究方向Physics
WOS类目Physics, Multidisciplinary
WOS记录号WOS:000238210900034
出版者IOP PUBLISHING LTD
引用统计
被引频次:3[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.imr.ac.cn/handle/321006/88995
专题中国科学院金属研究所
通讯作者Zhang, Y
作者单位Chinese Acad Sci, Inst Semicond, Ctr Mat Sci, Beijing 100083, Peoples R China
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GB/T 7714
Zhang, Y,Zeng, YP,Ma, L,et al. Nanoelectronic devices-resonant tunnelling diodes grown on InP substrates by molecular beam epitaxy with peak to valley current ratio of 17 at room temperature[J]. CHINESE PHYSICS,2006,15(6):1335-1338.
APA Zhang, Y.,Zeng, YP.,Ma, L.,Wang, BQ.,Zhu, ZP.,...&Yang, FH.(2006).Nanoelectronic devices-resonant tunnelling diodes grown on InP substrates by molecular beam epitaxy with peak to valley current ratio of 17 at room temperature.CHINESE PHYSICS,15(6),1335-1338.
MLA Zhang, Y,et al."Nanoelectronic devices-resonant tunnelling diodes grown on InP substrates by molecular beam epitaxy with peak to valley current ratio of 17 at room temperature".CHINESE PHYSICS 15.6(2006):1335-1338.
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