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Cathodic electro-deposition of WO3 and its photoelectrochemical anticorrosion for copper under visible light
Leng Wenhua; Liu Dongpo; Cheng Xiaofang; Zhu Wencai; Zhang Jianqing; Cao Chunan
Corresponding AuthorLeng Wenhua(lengwh@css.zju.edu.cn)
2007-07-01
Source PublicationACTA METALLURGICA SINICA
ISSN0412-1961
Volume43Issue:7Pages:764-768
AbstractWO3 film electrode with visible photoresponse was prepared by cathodic electrodeposition, in order to develop a photoelectrochemical approach for metal, such as copper, anticorrosion under visible light illumination. The influences of preparation conditions and the composition in anode compartment on its photoelectrochemical performance were investigated. The results show that the optimal preparation conditions are: electrodeposition potential at -0.45 V vs. saturated calomel electrode, deposit time 1600 s, sintered at 400 degrees C. In the presence of hole scavenger, such as formate, the photocurrent of the photoelectrode was the highest, and it increased with increasing pH and formate concentration in the anode cell. The photoelectrochemical approach for copper anti corrosion in 4 mol/dm(3) NaCl solution using the WO3 photoanode under visible light was proved to be practicable, which provides a new approach for photoelectrochemical anticorrosion for metals under visible light.
KeywordWO3 electrodeposition visible light copper photoelectrochemical anticorrosion
Indexed BySCI
Language英语
WOS Research AreaMetallurgy & Metallurgical Engineering
WOS SubjectMetallurgy & Metallurgical Engineering
WOS IDWOS:000248548200018
PublisherSCIENCE PRESS
Citation statistics
Cited Times:4[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/91604
Collection中国科学院金属研究所
Corresponding AuthorLeng Wenhua
Affiliation1.Zhejiang Univ, Dept Chem, Hangzhou 310027, Peoples R China
2.Coll Educ Shandong, Dept Chem & Chem Engn, Jinan 250013, Peoples R China
3.Chinese Acad Sci, Inst Met Res, State Key Lab Corros & Protect, Shenyang 110016, Peoples R China
Recommended Citation
GB/T 7714
Leng Wenhua,Liu Dongpo,Cheng Xiaofang,et al. Cathodic electro-deposition of WO3 and its photoelectrochemical anticorrosion for copper under visible light[J]. ACTA METALLURGICA SINICA,2007,43(7):764-768.
APA Leng Wenhua,Liu Dongpo,Cheng Xiaofang,Zhu Wencai,Zhang Jianqing,&Cao Chunan.(2007).Cathodic electro-deposition of WO3 and its photoelectrochemical anticorrosion for copper under visible light.ACTA METALLURGICA SINICA,43(7),764-768.
MLA Leng Wenhua,et al."Cathodic electro-deposition of WO3 and its photoelectrochemical anticorrosion for copper under visible light".ACTA METALLURGICA SINICA 43.7(2007):764-768.
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