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Microlenses fabricated by discontinuous dewetting and soft lithography
Yu, Xinhong; Wang, Zhe; Han, Yanchun
Corresponding AuthorHan, Yanchun(ychan@ciac.jl.cn)
2008-09-01
Source PublicationMICROELECTRONIC ENGINEERING
ISSN0167-9317
Volume85Issue:9Pages:1878-1881
AbstractThis letter describes an approach to fabricating microlens arrays with low cost and large area through the combination of discontinuous dewetting and reversible water-ice transition via a soft lithography replica process. Microlenses with different curvature can be tuned by the modulation of the wettability of the substrates. The microlenses fabricated can project clear miniaturized images. (C) 2008 Elsevier B.V. All rights reserved.
Keywordmicrolens soft lithography
Funding OrganizationNational Natural Science Foundation of China
DOI10.1016/j.mee.2008.06.001
Indexed BySCI
Language英语
Funding ProjectNational Natural Science Foundation of China[20621401] ; National Natural Science Foundation of China[50573077] ; National Natural Science Foundation of China[50773080]
WOS Research AreaEngineering ; Science & Technology - Other Topics ; Optics ; Physics
WOS SubjectEngineering, Electrical & Electronic ; Nanoscience & Nanotechnology ; Optics ; Physics, Applied
WOS IDWOS:000259768200005
PublisherELSEVIER SCIENCE BV
Citation statistics
Cited Times:10[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/95444
Collection中国科学院金属研究所
Corresponding AuthorHan, Yanchun
AffiliationChinese Acad Sci, Changchun Inst Appl Chem, Grad Sch Chinese Acad Sci, State Key Lab Polymer Phys & Chem, Changchun 130022, Peoples R China
Recommended Citation
GB/T 7714
Yu, Xinhong,Wang, Zhe,Han, Yanchun. Microlenses fabricated by discontinuous dewetting and soft lithography[J]. MICROELECTRONIC ENGINEERING,2008,85(9):1878-1881.
APA Yu, Xinhong,Wang, Zhe,&Han, Yanchun.(2008).Microlenses fabricated by discontinuous dewetting and soft lithography.MICROELECTRONIC ENGINEERING,85(9),1878-1881.
MLA Yu, Xinhong,et al."Microlenses fabricated by discontinuous dewetting and soft lithography".MICROELECTRONIC ENGINEERING 85.9(2008):1878-1881.
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