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Reactive sputter deposition of WO3 films by using two deposition methods 期刊论文
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2019, 卷号: 37, 期号: 3, 页码: 6
作者:  Yasuda, Yoji;  Hoshi, Yoichi;  Kobayashi, Shin-ichi;  Uchida, Takayuki;  Sawada, Yutaka;  Wang, Meihan;  Lei, Hao
收藏  |  浏览/下载：129/0  |  提交时间：2021/02/02
Theoretical investigations of the impurity axial displacement for ZnO:V3+ 期刊论文
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2011, 卷号: 29, 期号: 3, 页码: 6
作者:  Zhang, Zhi-Hong;  Wu, Shao-Yi;  Zhang, Hua-Ming
收藏  |  浏览/下载：99/0  |  提交时间：2021/02/02
Theoretical investigations of the impurity axial displacement for ZnO:V(3+) 期刊论文
Journal of Vacuum Science & Technology A, 2011, 卷号: 29, 期号: 3
作者:  Z. H. Zhang;  S. Y. Wu;  H. M. Zhang
收藏  |  浏览/下载：80/0  |  提交时间：2012/04/13
Spin-hamiltonian Parameters  Atomic Screening Constants  Doped Zno  Films  Local-structure  Scf Functions  Cr3++ Ions  Crystals  Semiconductors  Pressure  Spectra  
Preferential growth of helium-doped Ti films deposited by magnetron sputtering 期刊论文
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2009, 卷号: 27, 期号: 6, 页码: 1392-1399
作者:  Zhang, Lei;  Shi, L. Q.;  He, Z. J.;  Zhang, B.;  Wang, L. B.
收藏  |  浏览/下载：73/0  |  提交时间：2021/02/02
Preparation and thermal desorption properties of dc sputtered zirconium-hydrogen-helium thin films 期刊论文
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2008, 卷号: 26, 期号: 6, 页码: 1511-1518
作者:  Wei, Y. C.;  Shi, L. Q.;  Zhang, L.;  He, Z. J.;  Zhang, B.;  Wang, L. B.
收藏  |  浏览/下载：81/0  |  提交时间：2021/02/02
crystal microstructure  desorption  sputter deposition  surface morphology  thin films  transmission electron microscopy  X-ray diffraction  zirconium compounds  
Influence of N-2 gas pressure and negative bias voltage on the microstructure and properties of Cr-Si-N films by a hybrid coating system 期刊论文
Journal of Vacuum Science & Technology A, 2008, 卷号: 26, 期号: 5, 页码: 1188-1194
作者:  Q. M. Wang;  I. W. Park;  K. Kim
收藏  |  浏览/下载：83/0  |  提交时间：2012/04/13
Cathodic Arc Plasma  Mechanical-properties  Sputtering Techniques  Substrate Bias  Nanocomposite Films  Ion-bombardment  Thin-films  Deposition  Temperature  Hardness  
Effect of negative bias voltage on CrN films deposited by arc ion plating. II. Film composition, structure, and properties 期刊论文
Journal of Vacuum Science & Technology A, 2008, 卷号: 26, 期号: 5, 页码: 1267-1276
作者:  Q. M. Wang;  K. H. Kim
收藏  |  浏览/下载：91/0  |  提交时间：2012/04/13
Nitride Thin-films  Tin Films  Stainless-steel  Hard Coatings  Chromium  Stress  Growth  Model  Microstructure  Nitrogen  
Effect of negative bias voltage on CrN films deposited by arc ion plating. I. Macroparticles filtration and film-growth characteristics 期刊论文
Journal of Vacuum Science & Technology A, 2008, 卷号: 26, 期号: 5, 页码: 1258-1266
作者:  Q. M. Wang;  K. H. Kim
收藏  |  浏览/下载：84/0  |  提交时间：2012/04/13
Chromium Nitride Films  Hybrid Coating System  Structure Zone Model  Si-n Coatings  Mechanical-properties  Tin Films  Thin-films  Pulse Bias  Vacuum  Evaporation  
Influence of the external solenoid coil arrangement and excitation mode on plasma characteristics and target utilization in a dc-planar magnetron sputtering system 期刊论文
Journal of Vacuum Science & Technology A, 2007, 卷号: 25, 期号: 2, 页码: 209-214
作者:  X. B. Zhang;  J. Q. Xiao;  Z. L. Pei;  J. Gong;  C. Sun
收藏  |  浏览/下载：82/0  |  提交时间：2012/04/13
Deposition  Field  
Experiments and theoretical explanation of droplet elimination phenomenon in pulsed-bias arc deposition 期刊论文
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2004, 卷号: 22, 期号: 4, 页码: 1218-1222
作者:  Lin, GQ;  Zhao, YH;  Guo, HM;  Wang, DZ;  Dong, C;  Huang, RF;  Wen, LS
收藏  |  浏览/下载：135/0  |  提交时间：2021/02/02