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Sputtering gas pressure and target power dependence on the microstructure and properties of DC-magnetron sputtered AlB2-type WB2 films 期刊论文
JOURNAL OF ALLOYS AND COMPOUNDS, 2017, 卷号: 703, 页码: 188-197
作者:  Liu, Y. M.;  Han, R. Q.;  Liu, F.;  Pei, Z. L.;  Sun, C.;  Pei, ZL (reprint author), Chinese Acad Sci, Inst Met Res, Shenyang 110016, Peoples R China.
收藏  |  浏览/下载：125/0  |  提交时间：2017/08/17
Alb2-type Wb2 Films  Dc Magnetron Sputtering  Sputtering Pressure  Sputtering Power  Tribo-mechanical Properties