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High Reversible Strain in Nanotwinned Metals 期刊论文
ACS APPLIED MATERIALS & INTERFACES, 2021, 卷号: 13, 期号: 38, 页码: 46088-46096
Authors:  He, Suyun;  Jiang, Binbin;  Wang, Chunyang;  Chen, Chunjin;  Duan, Huichao;  Jin, Shuai;  Ye, Hengqiang;  Lu, Lei;  Du, Kui
Favorite  |  View/Download:214/0  |  Submit date:2021/11/22
nanotwinned metals  dislocations  reversible strain  strain analysis  TEM  HAADF-STEM  
电解液温度对直流电解沉积纳米孪晶Cu微观结构的影响 期刊论文
金属学报, 2018, 期号: 03, 页码: 428-434
Authors:  程钊;  金帅;  卢磊
Favorite  |  View/Download:117/0  |  Submit date:2018/06/05
直流电解沉积  纳米孪晶cu  电解液温度  阴极过电位  微观结构  
Effect of Electrolyte Temperature on Microstructures of Direct-Current Electrodeposited Nanotwinned Cu 期刊论文
ACTA METALLURGICA SINICA, 2018, 卷号: 54, 期号: 3, 页码: 428-434
Authors:  Cheng Zhao;  Jin Shuai;  Lu Lei
Favorite  |  View/Download:95/0  |  Submit date:2021/02/02
direct-current electrodeposition  nanotwinned Cu  electrolyte temperature  cathode overpotential  microstructure  
Effect of Electrolyte Temperature on Microstructures of Direct-Current Electrodeposited Nanotwinned Cu 期刊论文
ACTA METALLURGICA SINICA, 2018, 卷号: 54, 期号: 3, 页码: 428-434
Authors:  Cheng Zhao;  Jin Shuai;  Lu Lei
Favorite  |  View/Download:99/0  |  Submit date:2021/02/02
direct-current electrodeposition  nanotwinned Cu  electrolyte temperature  cathode overpotential  microstructure  
添加剂浓度对直流电解沉积纳米孪晶Cu微观结构的影响 期刊论文
金属学报, 2016, 期号: 8, 页码: 973-979
Authors:  金帅;  程钊;  潘庆松;  卢磊
Favorite  |  View/Download:145/0  |  Submit date:2016/12/28
纳米孪晶cu  直流电解沉积  孪晶片层尺寸  添加剂  
EFFECT OF ELECTROLYTE ADDITIVE CONCENTRATION ON MICROSTRUCTURE OF DIRECT CURRENT ELECTRODEPOSITED NANOTWINNED Cu 期刊论文
ACTA METALLURGICA SINICA, 2016, 卷号: 52, 期号: 8, 页码: 973-979
Authors:  Jin Shuai;  Cheng Zhao;  Pan Qingsong;  Lu Lei
Favorite  |  View/Download:133/0  |  Submit date:2021/02/02
nanotwinned Cu  direct-current electrodeposition  twin spacing  electrolyte additive  
电流密度对直流电解沉积纳米孪晶Cu微观结构的影响 期刊论文
金属学报, 2013, 期号: 5, 页码: 635-640
Authors:  金帅;  潘庆松;  卢磊
Favorite  |  View/Download:116/0  |  Submit date:2013/12/25
Cu  直流电解沉积  电流密度  纳米孪晶  晶粒尺寸  
一种<111>织构纳米孪晶Cu块体材料及制备方法 专利
专利类型: 发明专利, 申请日期: 2012-04-04, 公开日期: 2012-04-04
Inventors:  金帅, 尤泽升 and 卢磊
Favorite  |  View/Download:126/0  |  Submit date:2013/06/06