In situ investigation on the oxidation behavior of a RESn3 film by transmission electron microscopy

doi:10.1016/j.scriptamat.2011.09.006

IMR OpenIR

	In situ investigation on the oxidation behavior of a RESn3 film by transmission electron microscopy
	Li, C. F.; Liu, Z. Q.; Shang, P. J.; Shang, J. K.
通讯作者	Liu, Z. Q.(zqliu@imr.ac.cn)
	2011-12-01
发表期刊	SCRIPTA MATERIALIA
ISSN	1359-6462
卷号	65 期号:12 页码:1049-1052
摘要	An in situ ex-environmental transmission electron microscopy (TEM) study was carried out to investigate the oxidation behavior of RESn3 (RE = Nd, La, Ce) film in a room at 18 +/- 2 degrees C with 20 +/- 5% humidity. The original RESn3 compounds transformed into RE(OH)(3) nanocrystals and Sn clusters. This involved the selective oxidation of RE in RESn3 and the atomic diffusion of Sn atoms. The whole oxidation behavior was discussed from the thermodynamic viewpoint, and a reaction formula was proposed to summarize the oxidation of RESn3 under different ambient conditions. (C) 2011 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
关键词	RESn3 compounds Oxidation Thermodynamics Transmission electron microscopy (TEM)
资助者	Chinese Academy of Sciences ; National Basic Research Program of China ; Major National Science and Technology Program of China
DOI	10.1016/j.scriptamat.2011.09.006
收录类别	SCI
语种	英语
资助项目	Chinese Academy of Sciences ; National Basic Research Program of China[2010CB631006] ; Major National Science and Technology Program of China[2011ZX02602]
WOS研究方向	Science & Technology - Other Topics ; Materials Science ; Metallurgy & Metallurgical Engineering
WOS类目	Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary ; Metallurgy & Metallurgical Engineering
WOS记录号	WOS:000297448700005
出版者	PERGAMON-ELSEVIER SCIENCE LTD
引用统计	被引频次：11[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/105140
专题	中国科学院金属研究所
通讯作者	Liu, Z. Q.
作者单位	Chinese Acad Sci, Inst Met Res, Shenyang Natl Lab Mat Sci, Shenyang 110016, Peoples R China
推荐引用方式 GB/T 7714	Li, C. F.,Liu, Z. Q.,Shang, P. J.,et al. In situ investigation on the oxidation behavior of a RESn3 film by transmission electron microscopy[J]. SCRIPTA MATERIALIA,2011,65(12):1049-1052.
APA	Li, C. F.,Liu, Z. Q.,Shang, P. J.,&Shang, J. K..(2011).In situ investigation on the oxidation behavior of a RESn3 film by transmission electron microscopy.SCRIPTA MATERIALIA,65(12),1049-1052.
MLA	Li, C. F.,et al."In situ investigation on the oxidation behavior of a RESn3 film by transmission electron microscopy".SCRIPTA MATERIALIA 65.12(2011):1049-1052.