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The formation of two layers in the internal oxidation of binary alloys by two oxidants in the absence of external scales
Gesmundo, F; Niu, Y
Corresponding AuthorGesmundo, F()
1999-02-01
Source PublicationOXIDATION OF METALS
ISSN0030-770X
Volume51Issue:1-2Pages:129-158
AbstractAn improved treatment of the simultaneous internal oxidation of binary solid-solution alloys by two different oxidants (double internal oxidation) producing two subsequent layers divided by a sharp planar interface in the absence of external scales of the most-noble component has been developed by removing some of the approximations involved in previous theories. The kinetics of internal oxidation are calculated, based on the assumption that all the partial processes follow the parabolic rate law, as expected for diffusion-controlled processes. The overall thickness of internal oxidation for dual oxidants is found to be equal to or smaller than the sum of those produced by the two oxidants taken separately under the same experimental conditions. The ratio between the thickness of the two regions depends critically on the ratio between the diffusion coefficients of the two oxidants, so that under appropriate limiting conditions, one of the two layers becomes negligible. The degree of enrichment of the most-reactive component in the region of internal oxidation by two oxidants is found to be uniform over the whole zone, but lower than what would be produced by each of the oxidants taken singularly. The theoretical predictions are then compared to some experimental results. It is finally shown that the external layer will not contain the compound most stable on an absolute scale, but that most stable with respect to the actual composition of the gas phase, while scaling structures different from that assumed here are also possible.
Keywordbinary alloys internal oxidation two oxidants
Indexed BySCI
Language英语
WOS Research AreaMetallurgy & Metallurgical Engineering
WOS SubjectMetallurgy & Metallurgical Engineering
WOS IDWOS:000079260500007
PublisherKLUWER ACADEMIC/PLENUM PUBL
Citation statistics
Cited Times:24[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/108976
Collection中国科学院金属研究所
Corresponding AuthorGesmundo, F
Affiliation1.Univ Genoa, Fac Ingn, Ist Chim, I-16129 Genoa, Italy
2.Inst Corros & Protect Met, State Key Lab Corros, Shenyang 110015, Peoples R China
Recommended Citation
GB/T 7714
Gesmundo, F,Niu, Y. The formation of two layers in the internal oxidation of binary alloys by two oxidants in the absence of external scales[J]. OXIDATION OF METALS,1999,51(1-2):129-158.
APA Gesmundo, F,&Niu, Y.(1999).The formation of two layers in the internal oxidation of binary alloys by two oxidants in the absence of external scales.OXIDATION OF METALS,51(1-2),129-158.
MLA Gesmundo, F,et al."The formation of two layers in the internal oxidation of binary alloys by two oxidants in the absence of external scales".OXIDATION OF METALS 51.1-2(1999):129-158.
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