Properties of reactive magnetron sputtered ITO films without in-situ substrate heating and post-deposition annealing

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	Properties of reactive magnetron sputtered ITO films without in-situ substrate heating and post-deposition annealing
	Chen, M; Bai, XD; Gong, J; Sun, C; Huang, RF; Wen, LS
通讯作者	Sun, C()
	2000-05-01
发表期刊	JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY
ISSN	1005-0302
卷号	16 期号:3 页码:281-285
摘要	Indium tin oxide (ITO) films were prepared on polyester, Si and glass substrate with relatively high deposition rate of above 0.9 nm/s by DC reactive magnetron sputtering technique at the sputtering pressure of 0.06 Pa system, respectively. The dependence of resistivity on deposition parameters, such as deposition rate, target-to-substrate distance (TSD), oxygen flow rate and sputtering time (thickness), has been investigated, together with the structural and the optical properties. It was revealed that ail 110 films exhibited lattice expansion. The resistivity of ITO thin films shows significant substrate effect: much lower resistivity and broader process window have been reproducibly achieved for the deposition of ITO films onto polyester rather than those prepared on both Si and glass substrates. The films with resistivity of as low as 4.23 x 10(-4) R cm and average transmittance of similar to 78% at wavelength of 400 similar to 700 nm have been achieved for the films on polyester at room temperature.
收录类别	SCI
语种	英语
WOS研究方向	Materials Science ; Metallurgy & Metallurgical Engineering
WOS类目	Materials Science, Multidisciplinary ; Metallurgy & Metallurgical Engineering
WOS记录号	WOS:000086816700005
出版者	JOURNAL MATER SCI TECHNOL
引用统计	被引频次：9[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/110597
专题	中国科学院金属研究所
通讯作者	Sun, C
作者单位	Chinese Acad Sci, Met Res Inst, Shenyang 110015, Peoples R China
推荐引用方式 GB/T 7714	Chen, M,Bai, XD,Gong, J,et al. Properties of reactive magnetron sputtered ITO films without in-situ substrate heating and post-deposition annealing[J]. JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY,2000,16(3):281-285.
APA	Chen, M,Bai, XD,Gong, J,Sun, C,Huang, RF,&Wen, LS.(2000).Properties of reactive magnetron sputtered ITO films without in-situ substrate heating and post-deposition annealing.JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY,16(3),281-285.
MLA	Chen, M,et al."Properties of reactive magnetron sputtered ITO films without in-situ substrate heating and post-deposition annealing".JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY 16.3(2000):281-285.