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Properties of reactive magnetron sputtered ITO films without in-situ substrate heating and post-deposition annealing
Chen, M; Bai, XD; Gong, J; Sun, C; Huang, RF; Wen, LS
Corresponding AuthorSun, C()
2000-05-01
Source PublicationJOURNAL OF MATERIALS SCIENCE & TECHNOLOGY
ISSN1005-0302
Volume16Issue:3Pages:281-285
AbstractIndium tin oxide (ITO) films were prepared on polyester, Si and glass substrate with relatively high deposition rate of above 0.9 nm/s by DC reactive magnetron sputtering technique at the sputtering pressure of 0.06 Pa system, respectively. The dependence of resistivity on deposition parameters, such as deposition rate, target-to-substrate distance (TSD), oxygen flow rate and sputtering time (thickness), has been investigated, together with the structural and the optical properties. It was revealed that ail 110 films exhibited lattice expansion. The resistivity of ITO thin films shows significant substrate effect: much lower resistivity and broader process window have been reproducibly achieved for the deposition of ITO films onto polyester rather than those prepared on both Si and glass substrates. The films with resistivity of as low as 4.23 x 10(-4) R cm and average transmittance of similar to 78% at wavelength of 400 similar to 700 nm have been achieved for the films on polyester at room temperature.
Indexed BySCI
Language英语
WOS Research AreaMaterials Science ; Metallurgy & Metallurgical Engineering
WOS SubjectMaterials Science, Multidisciplinary ; Metallurgy & Metallurgical Engineering
WOS IDWOS:000086816700005
PublisherJOURNAL MATER SCI TECHNOL
Citation statistics
Cited Times:9[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/110597
Collection中国科学院金属研究所
Corresponding AuthorSun, C
AffiliationChinese Acad Sci, Met Res Inst, Shenyang 110015, Peoples R China
Recommended Citation
GB/T 7714
Chen, M,Bai, XD,Gong, J,et al. Properties of reactive magnetron sputtered ITO films without in-situ substrate heating and post-deposition annealing[J]. JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY,2000,16(3):281-285.
APA Chen, M,Bai, XD,Gong, J,Sun, C,Huang, RF,&Wen, LS.(2000).Properties of reactive magnetron sputtered ITO films without in-situ substrate heating and post-deposition annealing.JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY,16(3),281-285.
MLA Chen, M,et al."Properties of reactive magnetron sputtered ITO films without in-situ substrate heating and post-deposition annealing".JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY 16.3(2000):281-285.
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