Simulation of the influence of the filament arrangement on the gas phase during hot filament chemical vapor deposition of diamond films

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	Simulation of the influence of the filament arrangement on the gas phase during hot filament chemical vapor deposition of diamond films
	Song, GH ; Sun, C ; Huang, RF ; Wen, LS
通讯作者	Wen, LS()
	2000-05-01
发表期刊	JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
ISSN	0734-2101
卷号	18 期号:3 页码:860-863
摘要	The uniform temperature and mass current density of gas in deposition regions of films were very important to obtain uniform diamond films over a large area during hot filament chemical vapor deposition. The simulation showed that the two physical parameters of gas in the chamber varied as a function of space and were influenced by the arrangement of the filaments and the initial rate of the introduced gas. Regions of uniform temperature and mass current density existed in the chamber. The distributions of temperature and mass current density did not vary with the filament diameter. However, the value of the two physical parameters increased and declined with the increment of the diameter, respectively. An optimum distance between filaments was necessary to obtain uniform films over a large area. The mass current density increased with the initial rate of the introduced gas. These results might provide a basis for optimizing the technological parameters to obtain uniform diamond films over a large area. (C) 2000 American Vacuum Society. [S0734-2101(00)03703-9].
收录类别	SCI
语种	英语
WOS研究方向	Materials Science ; Physics
WOS类目	Materials Science, Coatings & Films ; Physics, Applied
WOS记录号	WOS:000087118000011
出版者	AMER INST PHYSICS
引用统计	被引频次：15[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/111147
专题	中国科学院金属研究所
通讯作者	Wen, LS
作者单位	1.Chinese Acad Sci, Met Res Inst, Shenyang 110015, Peoples R China 2.Shenyang Polytech Univ, Dept Mat Engn, Shenyang 110026, Peoples R China
推荐引用方式 GB/T 7714	Song, GH,Sun, C,Huang, RF,et al. Simulation of the influence of the filament arrangement on the gas phase during hot filament chemical vapor deposition of diamond films[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,2000,18(3):860-863.
APA	Song, GH,Sun, C,Huang, RF,&Wen, LS.(2000).Simulation of the influence of the filament arrangement on the gas phase during hot filament chemical vapor deposition of diamond films.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,18(3),860-863.
MLA	Song, GH,et al."Simulation of the influence of the filament arrangement on the gas phase during hot filament chemical vapor deposition of diamond films".JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS 18.3(2000):860-863.