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Scanning tunneling microscopy observation to formation procedure of nano-Ti film
Xie, TS; Du, H; Meng, XM; Sun, C; Wen, LS
Corresponding AuthorXie, TS(tsxie@imr.ac.cn)
2001-02-18
Source PublicationACTA METALLURGICA SINICA
ISSN0412-1961
Volume37Issue:2Pages:113-117
AbstractNano-Ti films with different thicknesses were deposited on polymer film substrate by magnetron sputtering. Scanning tunneling microscopy (STM) was used to study the structural characteristic. The results show that the film formed at the initial stage is composed of nuclei particles with diameter less than 2 nn and some particle accumulations. With increasing the sputtering time the deposited particles become island-like and then form Ti film consisted of nano particles. The average grain size increases with increasing thickness of film. The influences of substrate and magnetron sputtering conditions on the film structure were discussed.
Keywordmagnetron sputtering nano-Ti film scanning tunneling microscopy (STM)
Indexed BySCI
Language英语
WOS Research AreaMetallurgy & Metallurgical Engineering
WOS SubjectMetallurgy & Metallurgical Engineering
WOS IDWOS:000172766300001
PublisherSCIENCE CHINA PRESS
Citation statistics
Cited Times:5[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/113426
Collection中国科学院金属研究所
Corresponding AuthorXie, TS
AffiliationChinese Acad Sci, Inst Met Res, Atom Imaging Solids Lab, Shenyang 110016, Peoples R China
Recommended Citation
GB/T 7714
Xie, TS,Du, H,Meng, XM,et al. Scanning tunneling microscopy observation to formation procedure of nano-Ti film[J]. ACTA METALLURGICA SINICA,2001,37(2):113-117.
APA Xie, TS,Du, H,Meng, XM,Sun, C,&Wen, LS.(2001).Scanning tunneling microscopy observation to formation procedure of nano-Ti film.ACTA METALLURGICA SINICA,37(2),113-117.
MLA Xie, TS,et al."Scanning tunneling microscopy observation to formation procedure of nano-Ti film".ACTA METALLURGICA SINICA 37.2(2001):113-117.
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