Numerical study of temperature field in HFCVD diamond films

IMR OpenIR

	Numerical study of temperature field in HFCVD diamond films
	Wang, AY; Sun, C; Zou, YS; Huang, RF; Wen, LS
通讯作者	Wang, AY()
	2002-11-01
发表期刊	ACTA METALLURGICA SINICA
ISSN	0412-1961
卷号	38 期号:11 页码:1228-1232
摘要	When the relative parameters of hot filaments were fixed at the optimal values, the irradiance distribution and the temperature distribution of substrate were simulated during the growing process HFCVD diamond films. Considering the effect of heat conduction, the substrate temperature distributions under the condition of adiabatic border and 1000 K isothermal border are more uniform than those in pure heat radiation system. All these results may provide the basis for the growth of diamond films in HFCVD.
关键词	diamond film irradiance temperature field heat conduction HFCVD
收录类别	SCI
语种	英语
WOS研究方向	Metallurgy & Metallurgical Engineering
WOS类目	Metallurgy & Metallurgical Engineering
WOS记录号	WOS:000179827800019
出版者	SCIENCE CHINA PRESS
引用统计	被引频次：2[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/114080
专题	中国科学院金属研究所
通讯作者	Wang, AY
作者单位	Chinese Acad Sci, Inst Met Res, Shenyang 110016, Peoples R China
推荐引用方式 GB/T 7714	Wang, AY,Sun, C,Zou, YS,et al. Numerical study of temperature field in HFCVD diamond films[J]. ACTA METALLURGICA SINICA,2002,38(11):1228-1232.
APA	Wang, AY,Sun, C,Zou, YS,Huang, RF,&Wen, LS.(2002).Numerical study of temperature field in HFCVD diamond films.ACTA METALLURGICA SINICA,38(11),1228-1232.
MLA	Wang, AY,et al."Numerical study of temperature field in HFCVD diamond films".ACTA METALLURGICA SINICA 38.11(2002):1228-1232.