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Preparation and structure of nano-crystalline WO3(Si) thin films by pulsed excimer laser deposition
Fang, GJ; Liu, ZL; Yao, KL
通讯作者Fang, GJ()
2002
发表期刊JOURNAL OF INORGANIC MATERIALS
ISSN1000-324X
卷号17期号:1页码:139-144
摘要WO,, thin films were successfully synthesized on Si (111) substrate at different conditions by using scanning excimer laser ablation technique. The structure of WOx thin films deposited at different conditions was analyzed by STEM, XRD, RS. The thin films deposited at 300 and 400degreesC under 20Pa oxygen pressure showed nano-crystalline triclinic structure. The experimental results illustrate that the oxygen pressure and the deposition temperature are two important parameters for determining the structure and chemical composition of the synthesized thin films.
关键词WO3 thin films nano-crystalline PLD technique structural analyses preparation conditions Si (111)
收录类别SCI
语种英语
WOS研究方向Materials Science
WOS类目Materials Science, Ceramics
WOS记录号WOS:000174436700023
出版者SCIENCE CHINA PRESS
引用统计
被引频次:3[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.imr.ac.cn/handle/321006/114896
专题中国科学院金属研究所
通讯作者Fang, GJ
作者单位1.Huazhong Univ Sci & Technol, Natl Lab Laser Technol, Wuhan 430074, Peoples R China
2.Huazhong Univ Sci & Technol, Dept Phys, Wuhan 430074, Peoples R China
3.Xiangfan Univ, Dept Phys, Xiangtan 441053, Peoples R China
4.Chinese Acad Sci, Int Ctr Mat Phys, Shenyang 110015, Peoples R China
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Fang, GJ,Liu, ZL,Yao, KL. Preparation and structure of nano-crystalline WO3(Si) thin films by pulsed excimer laser deposition[J]. JOURNAL OF INORGANIC MATERIALS,2002,17(1):139-144.
APA Fang, GJ,Liu, ZL,&Yao, KL.(2002).Preparation and structure of nano-crystalline WO3(Si) thin films by pulsed excimer laser deposition.JOURNAL OF INORGANIC MATERIALS,17(1),139-144.
MLA Fang, GJ,et al."Preparation and structure of nano-crystalline WO3(Si) thin films by pulsed excimer laser deposition".JOURNAL OF INORGANIC MATERIALS 17.1(2002):139-144.
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