IMR OpenIR
Yield strength determination of TiN film by in-situ XRD stress analysis method
Qin, M; Ji, V; Xu, JH; Li, JB; Xu, KW; Ma, SL
2002
Source PublicationECRS 6: PROCEEDINGS OF THE 6TH EUROPEAN CONFERENCE ON RESIDUAL STRESSES
ISSN0255-5476
Volume404-7Pages:671-676
AbstractBy X-ray stress analysis technique, a new approach has been applied to determining the yield strength of polycrystalline TiN film with biaxial residual stress adherent to metal substrate. By plasma-assisted chemical vapor deposition (PACVD), TiN film was deposited on a strip of spring steel 60Mn allowing the film to be subjected to tensile stress under loading of the film/substrate. The film thickness is 2.5mum and the steel substrate thickness is 1.1mm. Longitudinal and transverse stresses, sigma(1), and sigma(2) of the film were measured in situ by X-ray diffraction. On the basis of the experimental results, the effective stress (sigma) over bar and the effective uniaxial strain (epsilon) over bar (t), were obtained. According to the (sigma) over bar - (epsilon) over bar (t), relation, the calculated proof stresses, sigma(0.1), and sigma(0.2), of TiN film are 4.2GPa and 4.4GPa, respectively.
Keywordyield strength TiN film biaxial stress X-ray diffraction
Indexed BySCI
Language英语
WOS Research AreaMaterials Science
WOS SubjectMaterials Science, Multidisciplinary
WOS IDWOS:000177256900104
PublisherTRANS TECH PUBLICATIONS LTD
Citation statistics
Cited Times:4[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/115129
Collection中国科学院金属研究所
Affiliation1.Chinese Acad Sci, Inst Met Res, SYNL Mat Sci, Shenyang 110016, Peoples R China
2.ENSAM, LM3 ESA CNRS 8006, F-75013 Paris, France
3.Xian Jiaotong Univ, State Key Lab Mech Behav Mat, Xian 710049, Peoples R China
Recommended Citation
GB/T 7714
Qin, M,Ji, V,Xu, JH,et al. Yield strength determination of TiN film by in-situ XRD stress analysis method[J]. ECRS 6: PROCEEDINGS OF THE 6TH EUROPEAN CONFERENCE ON RESIDUAL STRESSES,2002,404-7:671-676.
APA Qin, M,Ji, V,Xu, JH,Li, JB,Xu, KW,&Ma, SL.(2002).Yield strength determination of TiN film by in-situ XRD stress analysis method.ECRS 6: PROCEEDINGS OF THE 6TH EUROPEAN CONFERENCE ON RESIDUAL STRESSES,404-7,671-676.
MLA Qin, M,et al."Yield strength determination of TiN film by in-situ XRD stress analysis method".ECRS 6: PROCEEDINGS OF THE 6TH EUROPEAN CONFERENCE ON RESIDUAL STRESSES 404-7(2002):671-676.
Files in This Item:
There are no files associated with this item.
Related Services
Recommend this item
Bookmark
Usage statistics
Export to Endnote
Google Scholar
Similar articles in Google Scholar
[Qin, M]'s Articles
[Ji, V]'s Articles
[Xu, JH]'s Articles
Baidu academic
Similar articles in Baidu academic
[Qin, M]'s Articles
[Ji, V]'s Articles
[Xu, JH]'s Articles
Bing Scholar
Similar articles in Bing Scholar
[Qin, M]'s Articles
[Ji, V]'s Articles
[Xu, JH]'s Articles
Terms of Use
No data!
Social Bookmark/Share
All comments (0)
No comment.
 

Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.