Yield strength determination of TiN film by in-situ XRD stress analysis method | |
Qin, M; Ji, V; Xu, JH; Li, JB; Xu, KW; Ma, SL | |
2002 | |
Source Publication | ECRS 6: PROCEEDINGS OF THE 6TH EUROPEAN CONFERENCE ON RESIDUAL STRESSES
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ISSN | 0255-5476 |
Volume | 404-7Pages:671-676 |
Abstract | By X-ray stress analysis technique, a new approach has been applied to determining the yield strength of polycrystalline TiN film with biaxial residual stress adherent to metal substrate. By plasma-assisted chemical vapor deposition (PACVD), TiN film was deposited on a strip of spring steel 60Mn allowing the film to be subjected to tensile stress under loading of the film/substrate. The film thickness is 2.5mum and the steel substrate thickness is 1.1mm. Longitudinal and transverse stresses, sigma(1), and sigma(2) of the film were measured in situ by X-ray diffraction. On the basis of the experimental results, the effective stress (sigma) over bar and the effective uniaxial strain (epsilon) over bar (t), were obtained. According to the (sigma) over bar - (epsilon) over bar (t), relation, the calculated proof stresses, sigma(0.1), and sigma(0.2), of TiN film are 4.2GPa and 4.4GPa, respectively. |
Keyword | yield strength TiN film biaxial stress X-ray diffraction |
Indexed By | SCI |
Language | 英语 |
WOS Research Area | Materials Science |
WOS Subject | Materials Science, Multidisciplinary |
WOS ID | WOS:000177256900104 |
Publisher | TRANS TECH PUBLICATIONS LTD |
Citation statistics | |
Document Type | 期刊论文 |
Identifier | http://ir.imr.ac.cn/handle/321006/115129 |
Collection | 中国科学院金属研究所 |
Affiliation | 1.Chinese Acad Sci, Inst Met Res, SYNL Mat Sci, Shenyang 110016, Peoples R China 2.ENSAM, LM3 ESA CNRS 8006, F-75013 Paris, France 3.Xian Jiaotong Univ, State Key Lab Mech Behav Mat, Xian 710049, Peoples R China |
Recommended Citation GB/T 7714 | Qin, M,Ji, V,Xu, JH,et al. Yield strength determination of TiN film by in-situ XRD stress analysis method[J]. ECRS 6: PROCEEDINGS OF THE 6TH EUROPEAN CONFERENCE ON RESIDUAL STRESSES,2002,404-7:671-676. |
APA | Qin, M,Ji, V,Xu, JH,Li, JB,Xu, KW,&Ma, SL.(2002).Yield strength determination of TiN film by in-situ XRD stress analysis method.ECRS 6: PROCEEDINGS OF THE 6TH EUROPEAN CONFERENCE ON RESIDUAL STRESSES,404-7,671-676. |
MLA | Qin, M,et al."Yield strength determination of TiN film by in-situ XRD stress analysis method".ECRS 6: PROCEEDINGS OF THE 6TH EUROPEAN CONFERENCE ON RESIDUAL STRESSES 404-7(2002):671-676. |
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