Mechanical property of low temperature deposited TiN film by pulsed biased arc ion plating | |
Huang, MD; Sun, C; Lin, GQ; Dong, C; Wen, LS | |
Corresponding Author | Wen, LS() |
2003-05-11 | |
Source Publication | ACTA METALLURGICA SINICA
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ISSN | 0412-1961 |
Volume | 39Issue:5Pages:516-520 |
Abstract | TiN hard coatings were prepared by arc ion plating (AIP) with dc and pulsed biases, respectively. Systematic examinations and comparisons were executed on the temperature of substrates, the surface morphology and mechanical properties of the films. The results show that the temperatures of substrates decrease obviously when pulsed bias is used instead of dc bias, while the morphologies and properties of the obtained films are improved. Therefore it is a valid way to realize low temperature deposition of AIP by using pulsed biases. |
Keyword | arc ion plating low temperature deposition pulsed bias TiN film |
Indexed By | SCI |
Language | 英语 |
WOS Research Area | Metallurgy & Metallurgical Engineering |
WOS Subject | Metallurgy & Metallurgical Engineering |
WOS ID | WOS:000183358400010 |
Publisher | SCIENCE CHINA PRESS |
Citation statistics | |
Document Type | 期刊论文 |
Identifier | http://ir.imr.ac.cn/handle/321006/116209 |
Collection | 中国科学院金属研究所 |
Corresponding Author | Wen, LS |
Affiliation | 1.Chinese Acad Sci, Inst Met Res, Shenyang 110016, Peoples R China 2.Dalian Univ Technol, State Key Lav Mat Modificat Laser Ion & Electron, Dalian 116024, Peoples R China |
Recommended Citation GB/T 7714 | Huang, MD,Sun, C,Lin, GQ,et al. Mechanical property of low temperature deposited TiN film by pulsed biased arc ion plating[J]. ACTA METALLURGICA SINICA,2003,39(5):516-520. |
APA | Huang, MD,Sun, C,Lin, GQ,Dong, C,&Wen, LS.(2003).Mechanical property of low temperature deposited TiN film by pulsed biased arc ion plating.ACTA METALLURGICA SINICA,39(5),516-520. |
MLA | Huang, MD,et al."Mechanical property of low temperature deposited TiN film by pulsed biased arc ion plating".ACTA METALLURGICA SINICA 39.5(2003):516-520. |
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