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Mechanical property of low temperature deposited TiN film by pulsed biased arc ion plating
Huang, MD; Sun, C; Lin, GQ; Dong, C; Wen, LS
Corresponding AuthorWen, LS()
2003-05-11
Source PublicationACTA METALLURGICA SINICA
ISSN0412-1961
Volume39Issue:5Pages:516-520
AbstractTiN hard coatings were prepared by arc ion plating (AIP) with dc and pulsed biases, respectively. Systematic examinations and comparisons were executed on the temperature of substrates, the surface morphology and mechanical properties of the films. The results show that the temperatures of substrates decrease obviously when pulsed bias is used instead of dc bias, while the morphologies and properties of the obtained films are improved. Therefore it is a valid way to realize low temperature deposition of AIP by using pulsed biases.
Keywordarc ion plating low temperature deposition pulsed bias TiN film
Indexed BySCI
Language英语
WOS Research AreaMetallurgy & Metallurgical Engineering
WOS SubjectMetallurgy & Metallurgical Engineering
WOS IDWOS:000183358400010
PublisherSCIENCE CHINA PRESS
Citation statistics
Cited Times:10[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/116209
Collection中国科学院金属研究所
Corresponding AuthorWen, LS
Affiliation1.Chinese Acad Sci, Inst Met Res, Shenyang 110016, Peoples R China
2.Dalian Univ Technol, State Key Lav Mat Modificat Laser Ion & Electron, Dalian 116024, Peoples R China
Recommended Citation
GB/T 7714
Huang, MD,Sun, C,Lin, GQ,et al. Mechanical property of low temperature deposited TiN film by pulsed biased arc ion plating[J]. ACTA METALLURGICA SINICA,2003,39(5):516-520.
APA Huang, MD,Sun, C,Lin, GQ,Dong, C,&Wen, LS.(2003).Mechanical property of low temperature deposited TiN film by pulsed biased arc ion plating.ACTA METALLURGICA SINICA,39(5),516-520.
MLA Huang, MD,et al."Mechanical property of low temperature deposited TiN film by pulsed biased arc ion plating".ACTA METALLURGICA SINICA 39.5(2003):516-520.
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