Mechanical property of low temperature deposited TiN film by pulsed biased arc ion plating

IMR OpenIR

	Mechanical property of low temperature deposited TiN film by pulsed biased arc ion plating
	Huang, MD ; Sun, C ; Lin, GQ ; Dong, C ; Wen, LS
通讯作者	Wen, LS()
	2003-05-11
发表期刊	ACTA METALLURGICA SINICA
ISSN	0412-1961
卷号	39 期号:5 页码:516-520
摘要	TiN hard coatings were prepared by arc ion plating (AIP) with dc and pulsed biases, respectively. Systematic examinations and comparisons were executed on the temperature of substrates, the surface morphology and mechanical properties of the films. The results show that the temperatures of substrates decrease obviously when pulsed bias is used instead of dc bias, while the morphologies and properties of the obtained films are improved. Therefore it is a valid way to realize low temperature deposition of AIP by using pulsed biases.
关键词	arc ion plating low temperature deposition pulsed bias TiN film
收录类别	SCI
语种	英语
WOS研究方向	Metallurgy & Metallurgical Engineering
WOS类目	Metallurgy & Metallurgical Engineering
WOS记录号	WOS:000183358400010
出版者	SCIENCE CHINA PRESS
引用统计	被引频次：10[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/116209
专题	中国科学院金属研究所
通讯作者	Wen, LS
作者单位	1.Chinese Acad Sci, Inst Met Res, Shenyang 110016, Peoples R China 2.Dalian Univ Technol, State Key Lav Mat Modificat Laser Ion & Electron, Dalian 116024, Peoples R China
推荐引用方式 GB/T 7714	Huang, MD,Sun, C,Lin, GQ,et al. Mechanical property of low temperature deposited TiN film by pulsed biased arc ion plating[J]. ACTA METALLURGICA SINICA,2003,39(5):516-520.
APA	Huang, MD,Sun, C,Lin, GQ,Dong, C,&Wen, LS.(2003).Mechanical property of low temperature deposited TiN film by pulsed biased arc ion plating.ACTA METALLURGICA SINICA,39(5),516-520.
MLA	Huang, MD,et al."Mechanical property of low temperature deposited TiN film by pulsed biased arc ion plating".ACTA METALLURGICA SINICA 39.5(2003):516-520.