Macro-particle reduction mechanism in biased arc ion plating of TiN
Huang, MD; Lin, GQ; Zhao, YH; Sun, C; Wen, LS; Dong, CA
Corresponding AuthorDong, CA()
AbstractThe mechanism of macro-particles (MPs) contamination in arc ion plating is investigated on TiN films under different biases. The effect of the biases is analyzed from the viewpoint of plasma physics. It is shown that the negatively charged MPs are affected by the biases through a repulsive force from the negatively biased substrate. They are more easily charged by electrons under pulsed biases because they repeatedly move in and out of the oscillating plasma sheath. In d.c. bias modes, the plasma sheath is stable and its charging effect is weak. Thus the repulsive force from the substrate under the pulsed biases is higher than that under the d.c. ones, and therefore, MPs are significantly reduced. (C) 2003 Elsevier B.V. All rights reserved.
Keywordarc evaporation ion plating pulsed TiN macro-particles
Indexed BySCI
WOS Research AreaMaterials Science ; Physics
WOS SubjectMaterials Science, Coatings & Films ; Physics, Applied
WOS IDWOS:000186472800014
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Cited Times:60[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Corresponding AuthorDong, CA
Affiliation1.Dalian Univ Technol, Dept Mat Engn, State Key Lab Mat Modificat, Dalian 116204, Peoples R China
2.Chinese Acad Sci, Met Res Inst, Shenyang 110016, Peoples R China
Recommended Citation
GB/T 7714
Huang, MD,Lin, GQ,Zhao, YH,et al. Macro-particle reduction mechanism in biased arc ion plating of TiN[J]. SURFACE & COATINGS TECHNOLOGY,2003,176(1):109-114.
APA Huang, MD,Lin, GQ,Zhao, YH,Sun, C,Wen, LS,&Dong, CA.(2003).Macro-particle reduction mechanism in biased arc ion plating of TiN.SURFACE & COATINGS TECHNOLOGY,176(1),109-114.
MLA Huang, MD,et al."Macro-particle reduction mechanism in biased arc ion plating of TiN".SURFACE & COATINGS TECHNOLOGY 176.1(2003):109-114.
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