| Macro-particle reduction mechanism in biased arc ion plating of TiN | |
| Huang, MD; Lin, GQ; Zhao, YH; Sun, C; Wen, LS; Dong, CA | |
| Corresponding Author | Dong, CA() |
| 2003-11-01 | |
| Source Publication | SURFACE & COATINGS TECHNOLOGY
 |
| ISSN | 0257-8972 |
| Volume | 176Issue:1Pages:109-114 |
| Abstract | The mechanism of macro-particles (MPs) contamination in arc ion plating is investigated on TiN films under different biases. The effect of the biases is analyzed from the viewpoint of plasma physics. It is shown that the negatively charged MPs are affected by the biases through a repulsive force from the negatively biased substrate. They are more easily charged by electrons under pulsed biases because they repeatedly move in and out of the oscillating plasma sheath. In d.c. bias modes, the plasma sheath is stable and its charging effect is weak. Thus the repulsive force from the substrate under the pulsed biases is higher than that under the d.c. ones, and therefore, MPs are significantly reduced. (C) 2003 Elsevier B.V. All rights reserved. |
| Keyword | arc evaporation ion plating pulsed TiN macro-particles |
| DOI | 10.1016/S0257-8972(03)00017-3 |
| Indexed By | SCI |
| Language | 英语 |
| WOS Research Area | Materials Science ; Physics |
| WOS Subject | Materials Science, Coatings & Films ; Physics, Applied |
| WOS ID | WOS:000186472800014 |
| Publisher | ELSEVIER SCIENCE SA |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.imr.ac.cn/handle/321006/116753 |
| Collection | 中国科学院金属研究所 |
| Corresponding Author | Dong, CA |
| Affiliation | 1.Dalian Univ Technol, Dept Mat Engn, State Key Lab Mat Modificat, Dalian 116204, Peoples R China 2.Chinese Acad Sci, Met Res Inst, Shenyang 110016, Peoples R China |
| Recommended Citation GB/T 7714 | Huang, MD,Lin, GQ,Zhao, YH,et al. Macro-particle reduction mechanism in biased arc ion plating of TiN[J]. SURFACE & COATINGS TECHNOLOGY,2003,176(1):109-114. |
| APA | Huang, MD,Lin, GQ,Zhao, YH,Sun, C,Wen, LS,&Dong, CA.(2003).Macro-particle reduction mechanism in biased arc ion plating of TiN.SURFACE & COATINGS TECHNOLOGY,176(1),109-114. |
| MLA | Huang, MD,et al."Macro-particle reduction mechanism in biased arc ion plating of TiN".SURFACE & COATINGS TECHNOLOGY 176.1(2003):109-114. |
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