Macro-particle reduction mechanism in biased arc ion plating of TiN

doi:10.1016/S0257-8972(03)00017-3

IMR OpenIR

	Macro-particle reduction mechanism in biased arc ion plating of TiN
	Huang, MD ; Lin, GQ ; Zhao, YH ; Sun, C ; Wen, LS ; Dong, CA
通讯作者	Dong, CA()
	2003-11-01
发表期刊	SURFACE & COATINGS TECHNOLOGY
ISSN	0257-8972
卷号	176 期号:1 页码:109-114
摘要	The mechanism of macro-particles (MPs) contamination in arc ion plating is investigated on TiN films under different biases. The effect of the biases is analyzed from the viewpoint of plasma physics. It is shown that the negatively charged MPs are affected by the biases through a repulsive force from the negatively biased substrate. They are more easily charged by electrons under pulsed biases because they repeatedly move in and out of the oscillating plasma sheath. In d.c. bias modes, the plasma sheath is stable and its charging effect is weak. Thus the repulsive force from the substrate under the pulsed biases is higher than that under the d.c. ones, and therefore, MPs are significantly reduced. (C) 2003 Elsevier B.V. All rights reserved.
关键词	arc evaporation ion plating pulsed TiN macro-particles
DOI	10.1016/S0257-8972(03)00017-3
收录类别	SCI
语种	英语
WOS研究方向	Materials Science ; Physics
WOS类目	Materials Science, Coatings & Films ; Physics, Applied
WOS记录号	WOS:000186472800014
出版者	ELSEVIER SCIENCE SA
引用统计	被引频次：84[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/116753
专题	中国科学院金属研究所
通讯作者	Dong, CA
作者单位	1.Dalian Univ Technol, Dept Mat Engn, State Key Lab Mat Modificat, Dalian 116204, Peoples R China 2.Chinese Acad Sci, Met Res Inst, Shenyang 110016, Peoples R China
推荐引用方式 GB/T 7714	Huang, MD,Lin, GQ,Zhao, YH,et al. Macro-particle reduction mechanism in biased arc ion plating of TiN[J]. SURFACE & COATINGS TECHNOLOGY,2003,176(1):109-114.
APA	Huang, MD,Lin, GQ,Zhao, YH,Sun, C,Wen, LS,&Dong, CA.(2003).Macro-particle reduction mechanism in biased arc ion plating of TiN.SURFACE & COATINGS TECHNOLOGY,176(1),109-114.
MLA	Huang, MD,et al."Macro-particle reduction mechanism in biased arc ion plating of TiN".SURFACE & COATINGS TECHNOLOGY 176.1(2003):109-114.