| Microstructure and hardness of chromium oxide coatings by arc ion plating |
| Ji, AL; Wang, W; Song, GH; Wang, AY; Sin, C; Wen, LS
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| 通讯作者 | Ji, AL()
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| 2003-09-01
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| 发表期刊 | ACTA METALLURGICA SINICA
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| ISSN | 0412-1961
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| 卷号 | 39期号:9页码:979-983 |
| 摘要 | Chromium oxide thin film was deposited on stainless steel by arc ion plating (ATP). The effects of the flow rate of oxygen and pulse bias voltage on the structure, deposition rate and the surface morphology of thin film were studied. The microhardness of thin film was measured at different pulse bias voltage. The results show that the Cr2O3 film has {001} plane texture at the oxygen flow rate of 130 cm(3)/s and a bias voltage of -100 V. The higher the oxygen flow rate and bias voltage, the less the big particles in the thin film. Stoichiometric Cr2O3 thin film obtained at oxygen flow rate of 130 cm(3)/s and a bias voltage of -200 V has an optimal hardness value up to 36 GPa. |
| 关键词 | Cr2O3 thin film
arc ion plating
microstructure
pulse bias voltage
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| 收录类别 | SCI
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| 语种 | 英语
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| WOS研究方向 | Metallurgy & Metallurgical Engineering
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| WOS类目 | Metallurgy & Metallurgical Engineering
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| WOS记录号 | WOS:000186144000016
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| 出版者 | SCIENCE CHINA PRESS
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| 引用统计 |
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| 文献类型 | 期刊论文
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| 条目标识符 | http://ir.imr.ac.cn/handle/321006/117548
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| 专题 | 中国科学院金属研究所
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| 通讯作者 | Ji, AL |
| 作者单位 | Chinese Acad Sci, Inst Met Res, Shenyang 110016, Peoples R China
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推荐引用方式
GB/T 7714 |
Ji, AL,Wang, W,Song, GH,et al. Microstructure and hardness of chromium oxide coatings by arc ion plating[J]. ACTA METALLURGICA SINICA,2003,39(9):979-983.
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| APA |
Ji, AL,Wang, W,Song, GH,Wang, AY,Sin, C,&Wen, LS.(2003).Microstructure and hardness of chromium oxide coatings by arc ion plating.ACTA METALLURGICA SINICA,39(9),979-983.
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| MLA |
Ji, AL,et al."Microstructure and hardness of chromium oxide coatings by arc ion plating".ACTA METALLURGICA SINICA 39.9(2003):979-983.
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