Stress-strain relationship of a TiN film adherent to substrate

IMR OpenIR

	Stress-strain relationship of a TiN film adherent to substrate
	Qin, M ; Ji, N ; Wang, W ; Chen, CR ; Li, JB ; Ma, SL
通讯作者	Qin, M()
	2003-07-11
发表期刊	ACTA METALLURGICA SINICA
ISSN	0412-1961
卷号	39 期号:7 页码:721-724
摘要	By plasma-assisted chemical vapor deposition (PACVD), TiN film with 2.5 mum thickness was deposited on a strip of spring steel 60Mn, which can be subjected to tensile stress under loading of the film/substrate. Longitudinal and transverse stresses, sigma1, and sigma2, and applied strain, Sa, for TiN film were measured by X-ray tensile test. On the basis of the experimental results, the effective stress (σ) over bar and the effective uniaxial strain (ε(t)) over bar were obtained. According to the (σ) over bar- (ε(t)) over bar relation, the calculated proof stresses, sigma(0.1) and sigma(0.2), of TiN film are 4.2 GPa and 4.4 GPa, respectively. The hardness and Young's modulus determined by nanoindenter are 25 GPa and 420 GPa, respectively. The plastic flow in TiN film occurs under tensile.
关键词	TiN film biaxial stress stress-strain relation X-ray tensile test nanoindentation
收录类别	SCI
语种	英语
WOS研究方向	Metallurgy & Metallurgical Engineering
WOS类目	Metallurgy & Metallurgical Engineering
WOS记录号	WOS:000184627200009
出版者	SCIENCE CHINA PRESS
引用统计
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/117665
专题	中国科学院金属研究所
通讯作者	Qin, M
作者单位	1.Chinese Acad Sci, Met Res Inst, Shenyang Natl Lab Mat Sci, Shenyang 110016, Peoples R China 2.Ecole Natl Super Arts & Metiers, CNRS, LM3, ESA 8006, F-75013 Paris, France 3.Xian Jiaotong Univ, State Key Lab Mech Behav Mat, Xian 710049, Peoples R China
推荐引用方式 GB/T 7714	Qin, M,Ji, N,Wang, W,et al. Stress-strain relationship of a TiN film adherent to substrate[J]. ACTA METALLURGICA SINICA,2003,39(7):721-724.
APA	Qin, M,Ji, N,Wang, W,Chen, CR,Li, JB,&Ma, SL.(2003).Stress-strain relationship of a TiN film adherent to substrate.ACTA METALLURGICA SINICA,39(7),721-724.
MLA	Qin, M,et al."Stress-strain relationship of a TiN film adherent to substrate".ACTA METALLURGICA SINICA 39.7(2003):721-724.