Mechanism of effect of bias on morphologies of films prepared by arc ion plating

IMR OpenIR

	Mechanism of effect of bias on morphologies of films prepared by arc ion plating
	Huang, MD ; Lin, GQ ; Dong, C ; Sun, C ; Wen, LS
通讯作者	Huang, MD()
	2003-05-11
发表期刊	ACTA METALLURGICA SINICA
ISSN	0412-1961
卷号	39 期号:5 页码:510-515
摘要	This paper studies the mechanism of macroparticles(MPs) contamination of TiN films obtained by arc ion plating(AIP) under different biases modes. The effect of bias has been analyzed from the viewpoint of plasma physics. It is shown that MPs are affected by bias through the repulsive force from the negatively biased substrate. MPs are easily charged by electrons under pulsed bias because they repeatedly move in and out of the oscillating plasma sheath. In dc bias, the plasma sheath is almost stable and its charging effect is weak. Thus the repulsive force from the substrate under pulsed biases is higher than that under dc ones, resulting in obvious reduction of the MPs amount.
关键词	bias arc ion plating TiN thin film morphology
收录类别	SCI
语种	英语
WOS研究方向	Metallurgy & Metallurgical Engineering
WOS类目	Metallurgy & Metallurgical Engineering
WOS记录号	WOS:000183358400009
出版者	SCIENCE CHINA PRESS
引用统计	被引频次：10[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/117992
专题	中国科学院金属研究所
通讯作者	Huang, MD
作者单位	1.Dalian Univ Technol, State Key Lab Mat Modificat Laser Ion & Electron, Dalian 116024, Peoples R China 2.Chinese Acad Sci, Inst Met Res, Shenyang 110016, Peoples R China
推荐引用方式 GB/T 7714	Huang, MD,Lin, GQ,Dong, C,et al. Mechanism of effect of bias on morphologies of films prepared by arc ion plating[J]. ACTA METALLURGICA SINICA,2003,39(5):510-515.
APA	Huang, MD,Lin, GQ,Dong, C,Sun, C,&Wen, LS.(2003).Mechanism of effect of bias on morphologies of films prepared by arc ion plating.ACTA METALLURGICA SINICA,39(5),510-515.
MLA	Huang, MD,et al."Mechanism of effect of bias on morphologies of films prepared by arc ion plating".ACTA METALLURGICA SINICA 39.5(2003):510-515.