| EFFECT OF ELECTROLYTE ADDITIVE CONCENTRATION ON MICROSTRUCTURE OF DIRECT CURRENT ELECTRODEPOSITED NANOTWINNED Cu | |
| Jin Shuai; Cheng Zhao; Pan Qingsong; Lu Lei | |
| Corresponding Author | Lu Lei(llu@imr.ac.cn) |
| 2016-08-11 | |
| Source Publication | ACTA METALLURGICA SINICA
 |
| ISSN | 0412-1961 |
| Volume | 52Issue:8Pages:973-979 |
| Abstract | Nanotwinned metals have attracted widespread attentions recently, due to their unique overall properties, such as high strength, considerable ductility, enhanced work hardening and high electrical conductivity. The method of synthesized nanotwinned metals is an essential factor for influencing its application. To date, the direct-current electrodeposition technique is successfully used to fabricate bulk nanotwinned Cu samples. However, many parameters, such as the density of current, additive, the concentration of Cu2+, pH and temperature, influence the formation of nanoscale twins during electrodeposited process. To understand the effect of electrolyte additive on the formation of twins, in this work, gelatin with different concentrations was added into the electrolyte while other parameters are kept invariant. Bulk Cu with preferentially oriented nanoscale twins was synthesized in CuSO4 electrolyte with different concentrations of gelatin. The nanotwinned Cu sample is composed of columnar grains with high density nanoscale coherent twin boundaries, most of them are parallel to the growth surface. It is found that the concentration of the electrolyte addition plays an important role in the twin lamellar spacing of the nanotwinned Cu samples, but has little effect on grain size. No twins or twins with micro-sized spacing are detected in electrodeposited Cu without the electrolyte addition. With the concentration of gelatin increasing from 0.5 mg/L to 5 mg/L, the average twin lamellar thickness of the bulk nanotwinned Cu samples decreased from 150 nm to 30 nm. Twin boundaries also grow longer in grains with the increase of gelatin. This is because that with the increase of the concentration of gelatin, the overpotential of cathode increases and nucleation of twins becomes easier, resulting in the reduction of twin spacing. |
| Keyword | nanotwinned Cu direct-current electrodeposition twin spacing electrolyte additive |
| Funding Organization | National Natural Science Foundation of China ; National Basic Research Program of China |
| DOI | 10.11900/0412.1961.2015.00536 |
| Indexed By | SCI |
| Language | 英语 |
| Funding Project | National Natural Science Foundation of China[51420105001] ; National Natural Science Foundation of China[51371171] ; National Natural Science Foundation of China[51471172] ; National Basic Research Program of China[2012CB932202] |
| WOS Research Area | Metallurgy & Metallurgical Engineering |
| WOS Subject | Metallurgy & Metallurgical Engineering |
| WOS ID | WOS:000381541900010 |
| Publisher | SCIENCE PRESS |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.imr.ac.cn/handle/321006/122766 |
| Collection | 中国科学院金属研究所 |
| Corresponding Author | Lu Lei |
| Affiliation | Chinese Acad Sci, Inst Met Res, Shenyang Natl Lab Mat Sci, Shenyang 110016, Peoples R China |
| Recommended Citation GB/T 7714 | Jin Shuai,Cheng Zhao,Pan Qingsong,et al. EFFECT OF ELECTROLYTE ADDITIVE CONCENTRATION ON MICROSTRUCTURE OF DIRECT CURRENT ELECTRODEPOSITED NANOTWINNED Cu[J]. ACTA METALLURGICA SINICA,2016,52(8):973-979. |
| APA | Jin Shuai,Cheng Zhao,Pan Qingsong,&Lu Lei.(2016).EFFECT OF ELECTROLYTE ADDITIVE CONCENTRATION ON MICROSTRUCTURE OF DIRECT CURRENT ELECTRODEPOSITED NANOTWINNED Cu.ACTA METALLURGICA SINICA,52(8),973-979. |
| MLA | Jin Shuai,et al."EFFECT OF ELECTROLYTE ADDITIVE CONCENTRATION ON MICROSTRUCTURE OF DIRECT CURRENT ELECTRODEPOSITED NANOTWINNED Cu".ACTA METALLURGICA SINICA 52.8(2016):973-979. |
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