EFFECT OF ELECTROLYTE ADDITIVE CONCENTRATION ON MICROSTRUCTURE OF DIRECT CURRENT ELECTRODEPOSITED NANOTWINNED Cu

doi:10.11900/0412.1961.2015.00536

IMR OpenIR

	EFFECT OF ELECTROLYTE ADDITIVE CONCENTRATION ON MICROSTRUCTURE OF DIRECT CURRENT ELECTRODEPOSITED NANOTWINNED Cu
	Jin Shuai; Cheng Zhao; Pan Qingsong; Lu Lei
通讯作者	Lu Lei(llu@imr.ac.cn)
	2016-08-11
发表期刊	ACTA METALLURGICA SINICA
ISSN	0412-1961
卷号	52 期号:8 页码:973-979
摘要	Nanotwinned metals have attracted widespread attentions recently, due to their unique overall properties, such as high strength, considerable ductility, enhanced work hardening and high electrical conductivity. The method of synthesized nanotwinned metals is an essential factor for influencing its application. To date, the direct-current electrodeposition technique is successfully used to fabricate bulk nanotwinned Cu samples. However, many parameters, such as the density of current, additive, the concentration of Cu2+, pH and temperature, influence the formation of nanoscale twins during electrodeposited process. To understand the effect of electrolyte additive on the formation of twins, in this work, gelatin with different concentrations was added into the electrolyte while other parameters are kept invariant. Bulk Cu with preferentially oriented nanoscale twins was synthesized in CuSO4 electrolyte with different concentrations of gelatin. The nanotwinned Cu sample is composed of columnar grains with high density nanoscale coherent twin boundaries, most of them are parallel to the growth surface. It is found that the concentration of the electrolyte addition plays an important role in the twin lamellar spacing of the nanotwinned Cu samples, but has little effect on grain size. No twins or twins with micro-sized spacing are detected in electrodeposited Cu without the electrolyte addition. With the concentration of gelatin increasing from 0.5 mg/L to 5 mg/L, the average twin lamellar thickness of the bulk nanotwinned Cu samples decreased from 150 nm to 30 nm. Twin boundaries also grow longer in grains with the increase of gelatin. This is because that with the increase of the concentration of gelatin, the overpotential of cathode increases and nucleation of twins becomes easier, resulting in the reduction of twin spacing.
关键词	nanotwinned Cu direct-current electrodeposition twin spacing electrolyte additive
资助者	National Natural Science Foundation of China ; National Basic Research Program of China
DOI	10.11900/0412.1961.2015.00536
收录类别	SCI
语种	英语
资助项目	National Natural Science Foundation of China[51420105001] ; National Natural Science Foundation of China[51371171] ; National Natural Science Foundation of China[51471172] ; National Basic Research Program of China[2012CB932202]
WOS研究方向	Metallurgy & Metallurgical Engineering
WOS类目	Metallurgy & Metallurgical Engineering
WOS记录号	WOS:000381541900010
出版者	SCIENCE PRESS
引用统计	被引频次：4[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/122766
专题	中国科学院金属研究所
通讯作者	Lu Lei
作者单位	Chinese Acad Sci, Inst Met Res, Shenyang Natl Lab Mat Sci, Shenyang 110016, Peoples R China
推荐引用方式 GB/T 7714	Jin Shuai,Cheng Zhao,Pan Qingsong,et al. EFFECT OF ELECTROLYTE ADDITIVE CONCENTRATION ON MICROSTRUCTURE OF DIRECT CURRENT ELECTRODEPOSITED NANOTWINNED Cu[J]. ACTA METALLURGICA SINICA,2016,52(8):973-979.
APA	Jin Shuai,Cheng Zhao,Pan Qingsong,&Lu Lei.(2016).EFFECT OF ELECTROLYTE ADDITIVE CONCENTRATION ON MICROSTRUCTURE OF DIRECT CURRENT ELECTRODEPOSITED NANOTWINNED Cu.ACTA METALLURGICA SINICA,52(8),973-979.
MLA	Jin Shuai,et al."EFFECT OF ELECTROLYTE ADDITIVE CONCENTRATION ON MICROSTRUCTURE OF DIRECT CURRENT ELECTRODEPOSITED NANOTWINNED Cu".ACTA METALLURGICA SINICA 52.8(2016):973-979.