IMR OpenIR
Pitting growth rate on Alloy 800 in chloride solutions containing thiosulphate: image analysis assessment
Wang, Zeqing1; Wang, Jianqiu2; Behnamian, Yashar3; Gao, Zhiming1; Wang, Jihui1; Xia, Da-Hai1,2
Corresponding AuthorXia, Da-Hai(dahaixia@tju.edu.cn)
2018
Source PublicationCORROSION ENGINEERING SCIENCE AND TECHNOLOGY
ISSN1478-422X
Volume53Issue:3Pages:206-213
AbstractThe growth rate of pits formed on Alloy 800 in chloride solutions containing various thiosulphate concentrations was assessed by potentiostatic polarisation, in situ corrosion image observation, and image analysis. The pitting growth rate was a function of solution chemistry: in chloride solution pits were small but numerous, in chloride+thiosulphate solution, the pits were large. Competitive adsorption on Alloy 800 of chloride and thiosulphate ions affected the pitting potential and therefore the pitting growth rate on the metal. The reduction of thiosulphate to elemental sulphur accelerated the pitting growth rate in chloride+thiosulphate solutions.
KeywordAlloy 800 pitting corrosion passive film chloride thiosulphate image analysis
Funding OrganizationCAS Key Laboratory of Nuclear Materials and Safety Assessment (Institute of Metal Research, Chinese Academy of Sciences, China) ; National Natural Science Foundation of China ; Major State Basic Research Development Program (973 Program) ; Natural Science Foundation of Tianjin
DOI10.1080/1478422X.2018.1432738
Indexed BySCI
Language英语
Funding ProjectCAS Key Laboratory of Nuclear Materials and Safety Assessment (Institute of Metal Research, Chinese Academy of Sciences, China)[2016NMSAKF02] ; National Natural Science Foundation of China[51671144] ; Major State Basic Research Development Program (973 Program)[2014CB046805] ; Natural Science Foundation of Tianjin[17JCTPJC47100]
WOS Research AreaMaterials Science ; Metallurgy & Metallurgical Engineering
WOS SubjectMaterials Science, Multidisciplinary ; Metallurgy & Metallurgical Engineering
WOS IDWOS:000430840500007
PublisherTAYLOR & FRANCIS LTD
Citation statistics
Cited Times:18[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/127946
Collection中国科学院金属研究所
Corresponding AuthorXia, Da-Hai
Affiliation1.Tianjin Univ, Sch Mat Sci & Engn, Tianjin Key Lab Composite & Funct Mat, Tianjin 300072, Peoples R China
2.Chinese Acad Sci, Inst Met Res, CAS Key Lab Nucl Mat & Safety Assessment, Shenyang 110016, Liaoning, Peoples R China
3.Univ Alberta, Dept Chem & Mat Engn, Edmonton, AB, Canada
Recommended Citation
GB/T 7714
Wang, Zeqing,Wang, Jianqiu,Behnamian, Yashar,et al. Pitting growth rate on Alloy 800 in chloride solutions containing thiosulphate: image analysis assessment[J]. CORROSION ENGINEERING SCIENCE AND TECHNOLOGY,2018,53(3):206-213.
APA Wang, Zeqing,Wang, Jianqiu,Behnamian, Yashar,Gao, Zhiming,Wang, Jihui,&Xia, Da-Hai.(2018).Pitting growth rate on Alloy 800 in chloride solutions containing thiosulphate: image analysis assessment.CORROSION ENGINEERING SCIENCE AND TECHNOLOGY,53(3),206-213.
MLA Wang, Zeqing,et al."Pitting growth rate on Alloy 800 in chloride solutions containing thiosulphate: image analysis assessment".CORROSION ENGINEERING SCIENCE AND TECHNOLOGY 53.3(2018):206-213.
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