Extrinsic Parting Limit for Dealloying of Cu-Rh

doi:10.1149/2.0631816jes

IMR OpenIR

	Extrinsic Parting Limit for Dealloying of Cu-Rh
	Liu, Feng 1,2; Jin, Hai-Jun 1
通讯作者	Jin, Hai-Jun(hjjin@imr.ac.cn)
	2018-12-14
发表期刊	JOURNAL OF THE ELECTROCHEMICAL SOCIETY
ISSN	0013-4651
卷号	165 期号:16 页码:C999-C1006
摘要	Electrochemical dealloying of Cu- Rh alloys was systematically studied in 1 M H2SO4 aqueous solution in order to clarify the effect of Rh oxide passivation on dealloying behavior. Active dealloying, oxide passivation and transpassive dealloying regions were consecutively identified in their anodic polarization curves. The dealloying is rapid in both active and transpassive regions. The active dealloying region vanishes as Cu content decreases to below 85 at.%. When the Cu content is further decreased to below 75 at.%, the transpassive dealloying also ceases and the material becomes "stainless". This indicates that the parting limit for the dealloying of Cu-Rh is located at similar to 75 at.%, which is much higher than that of Au-Ag and other alloys that do not involve oxide passivation in dealloying. The high parting limit for Cu-Rh is associated with a passive layer of Rh oxide formed by corrosion, which hinders dealloying and nanoporosity evolution processes. The parting limit identified here may be an extrinsic property. The intrinsic parting limit of this alloy, i.e., the threshold composition below which the dealloying is hindered by a passive layer of Rh (instead of oxide passivation), could be lower-it may be obtained by avoiding any form of oxide passivation in corrosion. Moreover, all dealloyed nanoporous Rh shows a face centered cubic crystal structure, in contrast to the hexagonal close packed structure reported in Rh nanoparticles. (c) The Author(s) 2018. Published by ECS.
资助者	National Key R&D Program of China ; National Natural Science Foundation of China
DOI	10.1149/2.0631816jes
收录类别	SCI
语种	英语
资助项目	National Key R&D Program of China[2017YFA0204401] ; National Natural Science Foundation of China[51571206]
WOS研究方向	Electrochemistry ; Materials Science
WOS类目	Electrochemistry ; Materials Science, Coatings & Films
WOS记录号	WOS:000453347800001
出版者	ELECTROCHEMICAL SOC INC
引用统计	被引频次：11[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/130852
专题	中国科学院金属研究所
通讯作者	Jin, Hai-Jun
作者单位	1.Chinese Acad Sci, Inst Met Res, Shenyang Natl Lab Mat Sci, Shenyang 110016, Liaoning, Peoples R China 2.Univ Chinese Acad Sci, Beijing, Peoples R China
推荐引用方式 GB/T 7714	Liu, Feng,Jin, Hai-Jun. Extrinsic Parting Limit for Dealloying of Cu-Rh[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY,2018,165(16):C999-C1006.
APA	Liu, Feng,&Jin, Hai-Jun.(2018).Extrinsic Parting Limit for Dealloying of Cu-Rh.JOURNAL OF THE ELECTROCHEMICAL SOCIETY,165(16),C999-C1006.
MLA	Liu, Feng,et al."Extrinsic Parting Limit for Dealloying of Cu-Rh".JOURNAL OF THE ELECTROCHEMICAL SOCIETY 165.16(2018):C999-C1006.