Reactive sputter deposition of WO3 films by using two deposition methods

doi:10.1116/1.5092863

IMR OpenIR

	Reactive sputter deposition of WO3 films by using two deposition methods
	Yasuda, Yoji 1; Hoshi, Yoichi 1; Kobayashi, Shin-ichi 1; Uchida, Takayuki 1; Sawada, Yutaka 1; Wang, Meihan 2; Lei, Hao 3
通讯作者	Yasuda, Yoji(yyasuda@em.t-kougei.ac.jp)
	2019-05-01
发表期刊	JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
ISSN	0734-2101
卷号	37 期号:3 页码:6
摘要	Tungsten-trioxide (WO3) films were deposited using two types of sputtering systems: a planar magnetron sputtering system and a facing-target sputtering (FTS) system. The structure and gasochromic properties of the resulting films were compared, and film uniformity and gasochromic properties were found to be significantly improved when using FTS because the incidence of high-energy negative oxygen ions on the substrate during sputtering was significantly suppressed. The authors confirmed that the deposition rate of WO3 films increased by hundreds of times with an increase of the sputtering voltage from 500 to 800 V in the FTS system, and a deposition rate above 100 nm/min was easily achieved. The authors clarified that the deposition rate of the WO3 film strongly depends on the sputtering voltage under the condition of a constant sputtering current. Published by the AVS.
DOI	10.1116/1.5092863
收录类别	SCI
语种	英语
WOS研究方向	Materials Science ; Physics
WOS类目	Materials Science, Coatings & Films ; Physics, Applied
WOS记录号	WOS:000472182400032
出版者	A V S AMER INST PHYSICS
引用统计	被引频次：4[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/134152
专题	中国科学院金属研究所
通讯作者	Yasuda, Yoji
作者单位	1.Tokyo Polytech Univ, 1853 Iiyama, Atsugi, Kanagawa 2430297, Japan 2.Shenyang Univ, Sch Mech Engn, Shenyang 110044, Liaoning, Peoples R China 3.Chinese Acad Sci, Inst Met Res, Surface Engn Mat Div, Shenyang 110016, Liaoning, Peoples R China
推荐引用方式 GB/T 7714	Yasuda, Yoji,Hoshi, Yoichi,Kobayashi, Shin-ichi,et al. Reactive sputter deposition of WO3 films by using two deposition methods[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,2019,37(3):6.
APA	Yasuda, Yoji.,Hoshi, Yoichi.,Kobayashi, Shin-ichi.,Uchida, Takayuki.,Sawada, Yutaka.,...&Lei, Hao.(2019).Reactive sputter deposition of WO3 films by using two deposition methods.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,37(3),6.
MLA	Yasuda, Yoji,et al."Reactive sputter deposition of WO3 films by using two deposition methods".JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 37.3(2019):6.