High-Resolution X-Ray Diffraction Analysis of Epitaxial Films

doi:10.11900/0412.1961.2019.00006

IMR OpenIR

	High-Resolution X-Ray Diffraction Analysis of Epitaxial Films
	Li Changji 1; Zou Minjie 1,2; Zhang Lei 1; Wang Yuanming 1; Wang Sucheng 1
通讯作者	Zhang Lei(lzhang@imr.ac.cn) ; Wang Yuanming(ymwang@imr.ac.cn)
	2020
发表期刊	ACTA METALLURGICA SINICA
ISSN	0412-1961
卷号	56 期号:1 页码:99-111
摘要	Epitaxy technique has been widely used for semiconductor, ferroelectric and optical materials in the development of electronic and optoelectronic devices. Epitaxial structures with strain and defects may tune the physical properties or affect the performance of devices. High-resolution X-ray diffraction (HRXRD) has significant advantages over traditional XRD with the features of small divergence, monochromatic incident beam and high resolution detection of the diffracted beam. It is a key technique for accurate characterization of epitaxial structures in non-destructive way. In this paper, the techniques of HRXRD for epitaxial film structure characterization are outlined in terms of the relationship between diffraction and reciprocal space, the difference between high-resolution diffraction and powder diffraction such as the optical system and the geometry mode of scanning etc. Based on the corresponding relationship between the epitaxial film and the matrix structure in the reciprocal space, various factors affecting the shape of the diffraction spots are analyzed, including the state of lattice match in coherence and non-coherence, super lattice and inclined growth. The other effective factors are also demonstrated, such as finite size of film, tilt and strain of epitaxial film etc. Real examples, such as Si1-xGex(x=0.1) etc., are used to explain how to obtain the structure parameters of the epitaxial films by HRXRD spectrum analysis, including lattice constant, lattice mismatch, thickness and superlattice information. To obtain more epitaxy information, reciprocal space map (RSM) analysis can be feasibly used by reconstruction of a series of HRXRD patterns. By combining HRXRD spectrum and RSM, microstructure characterizations of PbTiO3 epitaxy films, such as micro-strain, domain structure, phase transformation can be quantitatively analyzed.
关键词	film growth epitaxial film high-resolution X-ray diffraction reciprocal space mapping
DOI	10.11900/0412.1961.2019.00006
收录类别	SCI
语种	英语
WOS研究方向	Metallurgy & Metallurgical Engineering
WOS类目	Metallurgy & Metallurgical Engineering
WOS记录号	WOS:000516535300007
出版者	SCIENCE PRESS
引用统计	被引频次：3[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/137702
专题	中国科学院金属研究所
通讯作者	Zhang Lei; Wang Yuanming
作者单位	1.Chinese Acad Sci, Shenyang Natl Lab Mat Sci, Inst Met Res, Shenyang 110016, Peoples R China 2.Univ Sci & Technol China, Sch Mat Sci & Engn, Shenyang 110016, Peoples R China
推荐引用方式 GB/T 7714	Li Changji,Zou Minjie,Zhang Lei,et al. High-Resolution X-Ray Diffraction Analysis of Epitaxial Films[J]. ACTA METALLURGICA SINICA,2020,56(1):99-111.
APA	Li Changji,Zou Minjie,Zhang Lei,Wang Yuanming,&Wang Sucheng.(2020).High-Resolution X-Ray Diffraction Analysis of Epitaxial Films.ACTA METALLURGICA SINICA,56(1),99-111.
MLA	Li Changji,et al."High-Resolution X-Ray Diffraction Analysis of Epitaxial Films".ACTA METALLURGICA SINICA 56.1(2020):99-111.