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The accelerating nanoscale Kirkendall effect in Co films-native oxide Si (100) system induced by high magnetic fields
Zhao, Yue1,2; Wang, Kai2; Yuan, Shuang3; Ma, Yonghui4; Li, Guojian2; Wang, Qiang2
Corresponding AuthorWang, Qiang(wangq@mail.neu.edu.cn)
2020-06-01
Source PublicationJOURNAL OF MATERIALS SCIENCE & TECHNOLOGY
ISSN1005-0302
Volume46Pages:127-135
AbstractThe morphology evolution and magnetic properties of Co films-native oxide Si (100) were investigated at 873, 973, and 1073 K in a high magnetic field of 11.5 T. Formation of Kirkendall voids in the Co films was found to cause morphology evolution due to the difference in diffusion flux of Co and Si atoms through the native oxide layer. The high magnetic fields had considerable effect on the morphology evolution by accelerating nanoscale Kirkendall effect. The diffusion mechanism in the presence of high magnetic fields was given to explain the increase of diffusion coefficient. The morphology evolution of Co films on native oxide Si (100) under high magnetic fields during annealing resulted in the magnetic properties variation. (C) 2020 Published by Elsevier Ltd on behalf of The editorial office of Journal of Materials Science & Technology.
KeywordThin films Annealing Diffusion Kirkendall effect High magnetic field
Funding OrganizationNational Natural Science Foundation of China ; Liaoning Innovative Research Team in University ; Fundamental Research Funds for the Central Universities
DOI10.1016/j.jmst.2019.11.038
Indexed BySCI
Language英语
Funding ProjectNational Natural Science Foundation of China[51425401] ; National Natural Science Foundation of China[51690162] ; Liaoning Innovative Research Team in University[LT2017011] ; Fundamental Research Funds for the Central Universities[N160907001] ; Fundamental Research Funds for the Central Universities[N180915002] ; Fundamental Research Funds for the Central Universities[N180912004]
WOS Research AreaMaterials Science ; Metallurgy & Metallurgical Engineering
WOS SubjectMaterials Science, Multidisciplinary ; Metallurgy & Metallurgical Engineering
WOS IDWOS:000525326000013
PublisherJOURNAL MATER SCI TECHNOL
Citation statistics
Cited Times:2[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/138145
Collection中国科学院金属研究所
Corresponding AuthorWang, Qiang
Affiliation1.Shenzhen Univ, Inst Microscale Optoelect, Shenzhen 518060, Peoples R China
2.Northeastern Univ, Key Lab Electromagnet Proc Mat, Minist Educ, Shenyang 110819, Peoples R China
3.Northeastern Univ, Sch Met, Dept New Energy Sci & Engn, Shenyang 110819, Peoples R China
4.Chinese Acad Sci, Inst Met Res, Shenyang 110016, Peoples R China
Recommended Citation
GB/T 7714
Zhao, Yue,Wang, Kai,Yuan, Shuang,et al. The accelerating nanoscale Kirkendall effect in Co films-native oxide Si (100) system induced by high magnetic fields[J]. JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY,2020,46:127-135.
APA Zhao, Yue,Wang, Kai,Yuan, Shuang,Ma, Yonghui,Li, Guojian,&Wang, Qiang.(2020).The accelerating nanoscale Kirkendall effect in Co films-native oxide Si (100) system induced by high magnetic fields.JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY,46,127-135.
MLA Zhao, Yue,et al."The accelerating nanoscale Kirkendall effect in Co films-native oxide Si (100) system induced by high magnetic fields".JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY 46(2020):127-135.
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