Characteristics of the Structure and Properties of ZnSnO3 Films by Varying the Magnetron Sputtering Parameters

IMR OpenIR

	Characteristics of the Structure and Properties of ZnSnO3 Films by Varying the Magnetron Sputtering Parameters
其他题名	Characteristics of the Structure and Properties of ZnSnO_3 Films by Varying the Magnetron Sputtering Parameters
	Wu FaYu 1; Li JianWei 1; Qi Yi 2; Ding WuTong 3; Guo YuanYuan 1; Zhou YanWen 1
	2016
发表期刊	ACTA METALLURGICA SINICA-ENGLISH LETTERS
ISSN	1006-7191
卷号	29 期号:9 页码:827-833
摘要	Transparent conductive oxide ZnSnO3 films were prepared by radio-frequency magnetron sputtering from powder targets and were characterized by X-ray photoelectron spectroscopy, X-ray diffraction, transmission electron microscopy, atomic force microscopy, surface profile, UV-Vis spectroscopy, and Hall effect. The structures of the films were either amorphous or nanocrystalline depending on sputtering parameters including deposition time, target power, chamber pressure, and the target substrate separation. The average transmittance of the ZnSnO3 films within the visible wavelength was approximately 80% and the resistivity of the ZnSnO3 films was in the range of 10(-3)-10(-4) Omega cm. The structural, optical, and electrical properties of the ZnSnO3 films could be adjusted and regulated by optimizing the sputtering process, allowing materials with specific properties to be designed.
其他摘要	Transparent conductive oxide ZnSnO_3 films were prepared by radio-frequency magnetron sputtering from powder targets and were characterized by X-ray photoelectron spectroscopy, X-ray diffraction, transmission electron microscopy, atomic force microscopy, surface profile, UV–Vis spectroscopy, and Hall effect. The structures of the films were either amorphous or nanocrystalline depending on sputtering parameters including deposition time, target power, chamber pressure, and the target–substrate separation. The average transmittance of the ZnSnO_3 films within the visible wavelength was approximately 80% and the resistivity of the ZnSnO_3 films was in the range of 10~(-3)–10~(-4) ? cm. The structural, optical, and electrical properties of the ZnSnO_3 films could be adjusted and regulated by optimizing the sputtering process, allowing materials with specific properties to be designed.
关键词	CONDUCTIVE OXIDE-FILMS THIN-FILMS TRANSPARENT ZnSnO3 film Powder target Magnetron sputtering Optical property Electrical property
收录类别	CSCD
语种	英语
资助项目	[National Natural Science Foundation of China] ; [Foundation of Educational Department of Liaoning] ; [Open Subject of Key Laboratory Liaoning Province]
CSCD记录号	CSCD:5804835
引用统计
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/142322
专题	中国科学院金属研究所
作者单位	1.Univ Sci & Technol Liaoning, Sch Met & Materials, Laser Adv Mfg Technol Ctr, Anshan 114051, Peoples R China 2.SINOTRUK Hong Kong Ltd, Jinan Casting & Forging Ctr, Zhangqiu 250200, Peoples R China 3.中国科学院金属研究所
推荐引用方式 GB/T 7714	Wu FaYu,Li JianWei,Qi Yi,et al. Characteristics of the Structure and Properties of ZnSnO3 Films by Varying the Magnetron Sputtering Parameters[J]. ACTA METALLURGICA SINICA-ENGLISH LETTERS,2016,29(9):827-833.
APA	Wu FaYu,Li JianWei,Qi Yi,Ding WuTong,Guo YuanYuan,&Zhou YanWen.(2016).Characteristics of the Structure and Properties of ZnSnO3 Films by Varying the Magnetron Sputtering Parameters.ACTA METALLURGICA SINICA-ENGLISH LETTERS,29(9),827-833.
MLA	Wu FaYu,et al."Characteristics of the Structure and Properties of ZnSnO3 Films by Varying the Magnetron Sputtering Parameters".ACTA METALLURGICA SINICA-ENGLISH LETTERS 29.9(2016):827-833.