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电弧离子镀沉积Cr-O-N活性扩散阻挡层
Alternative TitleCr-O-N FILMS DEPOSITED BY ARC ION PLATING AS ACTIVE DIFFUSION BARRIERS
王启民; 郭明虎; 柯培玲; 孙超; 黄荣芳; 闻立时
2004
Source Publication金属学报
ISSN0412-1961
Volume40.0Issue:012Pages:1264-1268
Abstract采用电弧离子镀技术在NiCoCrAlY涂层与高温合金基材DSM11间沉积不同成分的Cr-O—N薄膜作为扩散阻挡层,研究了900℃下氧化1400h后DSM11/Cr—O—N/NiCoCrAlY体系中Cr-O-N层阻挡合金元素互扩散的行为以及阻挡层对涂层氧化动力学曲线的影响.结果表明,Cr-O-N层在高温氧化过程中生成与涂层和基材有良好结合的富Al氧化物层,可以阻挡DSM11基体与NiCoCrAlY涂层间的元素互扩散,起到活性阻挡层的作用;Cr-O-N层中。和N含量影响生成富Al氧化物层的连续性和致密性,从而影响其阻挡元素互扩散的性能.几种成分的Cr-O-N活性扩散阻挡层对NiCoCrAlY涂层900℃下的高温氧化性能都有一定的改善作用,改善程度与阻挡层阻挡合金元素互扩散的程度保持一致.
KeywordCr-O-N 活性扩散阻挡层 电弧离子镀
Indexed ByCSCD
Language中文
CSCD IDCSCD:1797718
Citation statistics
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/143459
Collection中国科学院金属研究所
Affiliation中国科学院金属研究所
Recommended Citation
GB/T 7714
王启民,郭明虎,柯培玲,等. 电弧离子镀沉积Cr-O-N活性扩散阻挡层[J]. 金属学报,2004,40.0(012):1264-1268.
APA 王启民,郭明虎,柯培玲,孙超,黄荣芳,&闻立时.(2004).电弧离子镀沉积Cr-O-N活性扩散阻挡层.金属学报,40.0(012),1264-1268.
MLA 王启民,et al."电弧离子镀沉积Cr-O-N活性扩散阻挡层".金属学报 40.0.012(2004):1264-1268.
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