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黄铜在BTA中形成的表面膜特性
贺春林1; 韩文安2; 孙秋霞1
1996
Source Publication东北大学学报:自然科学版
ISSN1005-3026
Volume17.0Issue:005Pages:525-528
Abstract利用伏安法,椭圆偏振法和XPS法对黄铜在BTA中形成的表面化学转化膜的成分,结构,厚度及导电性进行了结果表明,表面膜层属半导体,膜易被击穿,膜层为双层结构,即黄铜/Cu2O/Cu(I)BTA膜。
Keyword黄铜 化学转化膜 苯并二氮唑 表面膜 缓蚀剂
Indexed ByCSCD
Language中文
CSCD IDCSCD:294412
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Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/143752
Collection中国科学院金属研究所
Affiliation1.东北大学
2.中国科学院金属研究所
Recommended Citation
GB/T 7714
贺春林,韩文安,孙秋霞. 黄铜在BTA中形成的表面膜特性[J]. 东北大学学报:自然科学版,1996,17.0(005):525-528.
APA 贺春林,韩文安,&孙秋霞.(1996).黄铜在BTA中形成的表面膜特性.东北大学学报:自然科学版,17.0(005),525-528.
MLA 贺春林,et al."黄铜在BTA中形成的表面膜特性".东北大学学报:自然科学版 17.0.005(1996):525-528.
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