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电弧离子镀Ti(CxN1—x)薄膜的结构和力学性能研究
李明升; 王福会; 孙超; 蒋长荣; 闻立时
2002
Source Publication材料保护
ISSN1001-1560
Volume35.0Issue:012Pages:10-12
Abstract利用电弧离子镀设备,沉积了不同C、N比的Ti(CxN1-x)薄膜,研究了C含量对Ti(CxN1-x)薄膜的结构(相结构、择优取向及晶格常数)及力学性能(硬度、膜基结合强度及抗磨损性能)的影响。结果表明,复合镀层的C、N比随CH4、H2流量之比而变化,但原子百分数之和基本不变(约46.5%)。复合镀层结构致密,与基体结合良好,抗磨和切削性能优于TiC和TiN镀层。
Keyword电弧离子镀 Ti(CxN1-x)薄膜 结构 力学性能 研究 电弧
Indexed ByCSCD
Language中文
CSCD IDCSCD:1030085
Citation statistics
Cited Times:2[CSCD]   [CSCD Record]
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/144261
Collection中国科学院金属研究所
Affiliation中国科学院金属研究所
Recommended Citation
GB/T 7714
李明升,王福会,孙超,等. 电弧离子镀Ti(CxN1—x)薄膜的结构和力学性能研究[J]. 材料保护,2002,35.0(012):10-12.
APA 李明升,王福会,孙超,蒋长荣,&闻立时.(2002).电弧离子镀Ti(CxN1—x)薄膜的结构和力学性能研究.材料保护,35.0(012),10-12.
MLA 李明升,et al."电弧离子镀Ti(CxN1—x)薄膜的结构和力学性能研究".材料保护 35.0.012(2002):10-12.
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