| The microstructure and optical properties of SiNx deposited by linear microwave chemical vapor deposition | |
| Alternative Title | The microstructure and optical properties of SiN_x deposited by linear microwave chemical vapor deposition |
| Zhang Jian; Ba DeChun; Zhao ChongLing; Liu Kun; Du GuangYu | |
| 2015 | |
| Source Publication | ACTA PHYSICA SINICA
 |
| ISSN | 1000-3290 |
| Volume | 64Issue:6 |
| Abstract | SiNx films are synthesized on Si substrates in a home-made linear microwave plasma enhanced chemical vapor deposition system at different microwave powers, duty cycles, substrate temperatures, and ratios of silane (SiH4) flow to ammonia (NH3) gas flow. The effects of technological parameters on morphology of film surface, stoichiometric proportion, refractive index and deposition rate of SiNx film are characterized by scanning electron microscopy (SEM) and elliptical polarization instrument, and the relationships among stoichiometric proportion, refractive index and deposition rate are investigated. The results from SEM analysis indicate that the surfaces are smooth and the elements are homogeneously distributed in the films obtained under different deposition parameters. The ratio of SiH4 flow to NH3 gas flow and the duty cycle are the most critical factors determining the refractive index which can be changed from 1.92 to 2.33. The thickness measurements show that the deposition rate of SiNx film is affected by microwave power, duty cycle, substrate temperature and flow ratio. The maximum deposition rate achieved in the paper is 135 nm.min(-1). |
| Keyword | SILICON-NITRIDE FILMS THIN-FILMS PLASMA PHOTOLUMINESCENCE TEMPERATURE SiNx thin film linear microwave chemical vapor deposition refractivity deposition rate |
| Indexed By | CSCD |
| Language | 英语 |
| Funding Project | [Doctoral Fund of Ministry of Education of China] |
| CSCD ID | CSCD:5381201 |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.imr.ac.cn/handle/321006/145493 |
| Collection | 中国科学院金属研究所 |
| Affiliation | 中国科学院金属研究所 |
| Recommended Citation GB/T 7714 | Zhang Jian,Ba DeChun,Zhao ChongLing,et al. The microstructure and optical properties of SiNx deposited by linear microwave chemical vapor deposition[J]. ACTA PHYSICA SINICA,2015,64(6). |
| APA | Zhang Jian,Ba DeChun,Zhao ChongLing,Liu Kun,&Du GuangYu.(2015).The microstructure and optical properties of SiNx deposited by linear microwave chemical vapor deposition.ACTA PHYSICA SINICA,64(6). |
| MLA | Zhang Jian,et al."The microstructure and optical properties of SiNx deposited by linear microwave chemical vapor deposition".ACTA PHYSICA SINICA 64.6(2015). |
| Files in This Item: | There are no files associated with this item. | |||||
Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.
Edit Comment