The microstructure and optical properties of SiNx deposited by linear microwave chemical vapor deposition

IMR OpenIR

	The microstructure and optical properties of SiNx deposited by linear microwave chemical vapor deposition
其他题名	The microstructure and optical properties of SiN_x deposited by linear microwave chemical vapor deposition
	Zhang Jian; Ba DeChun; Zhao ChongLing; Liu Kun; Du GuangYu
	2015
发表期刊	ACTA PHYSICA SINICA
ISSN	1000-3290
卷号	64 期号:6
摘要	SiNx films are synthesized on Si substrates in a home-made linear microwave plasma enhanced chemical vapor deposition system at different microwave powers, duty cycles, substrate temperatures, and ratios of silane (SiH4) flow to ammonia (NH3) gas flow. The effects of technological parameters on morphology of film surface, stoichiometric proportion, refractive index and deposition rate of SiNx film are characterized by scanning electron microscopy (SEM) and elliptical polarization instrument, and the relationships among stoichiometric proportion, refractive index and deposition rate are investigated. The results from SEM analysis indicate that the surfaces are smooth and the elements are homogeneously distributed in the films obtained under different deposition parameters. The ratio of SiH4 flow to NH3 gas flow and the duty cycle are the most critical factors determining the refractive index which can be changed from 1.92 to 2.33. The thickness measurements show that the deposition rate of SiNx film is affected by microwave power, duty cycle, substrate temperature and flow ratio. The maximum deposition rate achieved in the paper is 135 nm.min(-1).
关键词	SILICON-NITRIDE FILMS THIN-FILMS PLASMA PHOTOLUMINESCENCE TEMPERATURE SiNx thin film linear microwave chemical vapor deposition refractivity deposition rate
收录类别	CSCD
语种	英语
资助项目	[Doctoral Fund of Ministry of Education of China]
CSCD记录号	CSCD:5381201
引用统计
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/145496
专题	中国科学院金属研究所
作者单位	中国科学院金属研究所
推荐引用方式 GB/T 7714	Zhang Jian,Ba DeChun,Zhao ChongLing,et al. The microstructure and optical properties of SiNx deposited by linear microwave chemical vapor deposition[J]. ACTA PHYSICA SINICA,2015,64(6).
APA	Zhang Jian,Ba DeChun,Zhao ChongLing,Liu Kun,&Du GuangYu.(2015).The microstructure and optical properties of SiNx deposited by linear microwave chemical vapor deposition.ACTA PHYSICA SINICA,64(6).
MLA	Zhang Jian,et al."The microstructure and optical properties of SiNx deposited by linear microwave chemical vapor deposition".ACTA PHYSICA SINICA 64.6(2015).