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The microstructure and optical properties of SiNx deposited by linear microwave chemical vapor deposition
Alternative TitleThe microstructure and optical properties of SiN_x deposited by linear microwave chemical vapor deposition
Zhang Jian; Ba DeChun; Zhao ChongLing; Liu Kun; Du GuangYu
2015
Source PublicationACTA PHYSICA SINICA
ISSN1000-3290
Volume64Issue:6
AbstractSiNx films are synthesized on Si substrates in a home-made linear microwave plasma enhanced chemical vapor deposition system at different microwave powers, duty cycles, substrate temperatures, and ratios of silane (SiH4) flow to ammonia (NH3) gas flow. The effects of technological parameters on morphology of film surface, stoichiometric proportion, refractive index and deposition rate of SiNx film are characterized by scanning electron microscopy (SEM) and elliptical polarization instrument, and the relationships among stoichiometric proportion, refractive index and deposition rate are investigated. The results from SEM analysis indicate that the surfaces are smooth and the elements are homogeneously distributed in the films obtained under different deposition parameters. The ratio of SiH4 flow to NH3 gas flow and the duty cycle are the most critical factors determining the refractive index which can be changed from 1.92 to 2.33. The thickness measurements show that the deposition rate of SiNx film is affected by microwave power, duty cycle, substrate temperature and flow ratio. The maximum deposition rate achieved in the paper is 135 nm.min(-1).
KeywordSILICON-NITRIDE FILMS THIN-FILMS PLASMA PHOTOLUMINESCENCE TEMPERATURE SiNx thin film linear microwave chemical vapor deposition refractivity deposition rate
Indexed ByCSCD
Language英语
Funding Project[Doctoral Fund of Ministry of Education of China]
CSCD IDCSCD:5381201
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Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/145496
Collection中国科学院金属研究所
Affiliation中国科学院金属研究所
Recommended Citation
GB/T 7714
Zhang Jian,Ba DeChun,Zhao ChongLing,et al. The microstructure and optical properties of SiNx deposited by linear microwave chemical vapor deposition[J]. ACTA PHYSICA SINICA,2015,64(6).
APA Zhang Jian,Ba DeChun,Zhao ChongLing,Liu Kun,&Du GuangYu.(2015).The microstructure and optical properties of SiNx deposited by linear microwave chemical vapor deposition.ACTA PHYSICA SINICA,64(6).
MLA Zhang Jian,et al."The microstructure and optical properties of SiNx deposited by linear microwave chemical vapor deposition".ACTA PHYSICA SINICA 64.6(2015).
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