The TiN film was prepared by multi-arc ion plating process on titanium alloy substrate or carbon steel substrate with different bias voltage and different nitrogen partial pressure. The phase structure, residual stress inside film, hardness of film/substrate system, adhesive strength between film and substrate, and tribolocical behavior were studied. The test results show that the bias voltage affects phase structure and residual stress of film. The adhesive strength of film/substrate will decrease and the tribological performance will be affected consequently when bias voltage is excessive high or low. As N2 partial pressure increases the particle size of Ti molten droplet becomes large, the amount of Ti2N decreases, and the hardness of film heightens. The excess on highness or lowness of N2 partial pressure can decrease critical load in scratching test. In the range of the tests, the friction coefficient of film/substrate system was decreased but wear resistance was not expectant improved with the increase of N2 partial pressure
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