| 多铁性BiFeO3/SrTiO3多层膜的透射电镜研究 | |
| Alternative Title | Transmission electron microscopic study of BiFeO3 /SrTiO3 multiferroic multilayers |
| 唐兆俊; 王君伟; 朱银莲; 唐为华; 马秀良 | |
| 2010 | |
| Source Publication | 电子显微学报
 |
| ISSN | 1000-6281 |
| Volume | 29.0Issue:004Pages:338-343 |
| Abstract | 本文利用透射电子显微镜（TEM）研究了由磁控溅射法生长的多铁性BiFeO3/SrTiO3多层膜的微观结构。衍衬分析及高分辨电子显微（HRTEM）像显示出界面清晰的各个单层。BiFeO3外延生长在SrTiO3（001）衬底上,生长方向沿基体c轴。随着薄膜厚度的增加,即多层膜周期的加长,层与层之间界面不再平直。原子序数Z衬度成像,EDS线扫以及各种元素的能量过滤综合分析确定了多层膜的成分变化特征。 |
| Other Abstract | Microstructures of BiFeO3 /SrTiO3 Multiferroic multilayers prepared by magnetron sputtering were studied by transmission electron microscopy（TEM）.Electron diffraction and contrast analysis reveal a very clear and well separated layer sequence.The BiFeO3 /SrTiO3 multilayer is epitaxially grown on the substrate.The interface between the thin film and the substrate is sharp and distinct.High-angle angular dark-field imaging,elemental mapping and compositional analysis revealed that the compositions vary with the layer periodicity as expected.Due to the local composition inhomogeneity resulted from the sputtering process,it is found that interfaces become rough when increasing the thickness of the films. |
| Keyword | 多铁性 多层膜 界面 透射电子显微术 |
| Indexed By | CSCD |
| Language | 中文 |
| CSCD ID | CSCD:3984267 |
| Citation statistics |
Cited Times:1[CSCD]
[CSCD Record]
|
| Document Type | 期刊论文 |
| Identifier | http://ir.imr.ac.cn/handle/321006/146969 |
| Collection | 中国科学院金属研究所 |
| Affiliation | 中国科学院金属研究所 |
| Recommended Citation GB/T 7714 | 唐兆俊,王君伟,朱银莲,等. 多铁性BiFeO3/SrTiO3多层膜的透射电镜研究[J]. 电子显微学报,2010,29.0(004):338-343. |
| APA | 唐兆俊,王君伟,朱银莲,唐为华,&马秀良.(2010).多铁性BiFeO3/SrTiO3多层膜的透射电镜研究.电子显微学报,29.0(004),338-343. |
| MLA | 唐兆俊,et al."多铁性BiFeO3/SrTiO3多层膜的透射电镜研究".电子显微学报 29.0.004(2010):338-343. |
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