| 含氟水溶液中电化学刻蚀氟化WO3薄膜电极增强可见光光电化学性能 | |
| Alternative Title | Enhanced Photoelectrochemical Performance of WO3 Film Electrode under Visible Light by Electrochemical Etching Fluorination in Aqueous Solutions Containing Fluorine |
| 李文; 冷文华; 牛振江; 李想; 费会; 张鉴清; 曹楚南 | |
| 2009 | |
| Source Publication | 物理化学学报
 |
| ISSN | 1000-6818 |
| Volume | 000Issue:012Pages:2427-2432 |
| Abstract | 报道了在含氟的酸性水溶液中,对电沉积制备的WO3薄膜电极进行电化学刻蚀,并采用光电化学、扫描电子显微镜（SEM）、X射线衍射（XRD）、光电子能谱（XPS）、紫外-可见漫反射光谱、光致发光（PL）等方法对电极进行了表征.结果表明,刻蚀使电极比表面积增大,质量减少,重要的是可使电极表面状态发生变化.在相同催化剂质量和比表面积的条件下,这种变化显著提高了WO3薄膜电极在可见光和紫外-可见光照下的光电转换性能.机理研究表明,电极光电化学性能提高可归因于刻蚀使电极表面发生氟化,光生载流子表面复合中心数目减少,平带电位负移.刻蚀对电极的吸光性质和晶体结构等未检测出明显变化.氟化电极在酸性中具有良好的光电化学稳定性. |
| Other Abstract | A new and simple method of electrochemical etching in acidic aqueous solutions containing fluorine for the electrodeposited WO3 thin films is presented.The samples were characterized by photoelectrochemistry,scanning electron microscopy（SEM）,X-ray diffraction（XRD）,X-ray photoelectron spectroscopy（XPS）,UV-Vis diffuse reflectance spectroscopy,and photoluminescence（PL）.Results showed that the etching increased the specific surface area with a concomitant reduction in the catalyst mass and also a change in the surface status of the electrodes.This modification of the surface status improved the photoelectrochemical performance of the electrodes under visible and UV-Vis light illumination with the same mass and specific surface area.This enhancement can be ascribed to the surface fluorination of the electrodes,which result in a decrease in the surface recombination centers and a negative shift in the flatband potential.The light absorption and crystalline were found to be unchanged by etching.The etched WO3 film electrode shows excellent photoelectrochemical stability in acid solutions.This provides a novel method for increasing thephoton electric conversion efficiency of WO3 thin film electrodes. |
| Keyword | WO3 电化学刻蚀 氟化 光电化学 可见光 |
| Indexed By | CSCD |
| Language | 中文 |
| CSCD ID | CSCD:3777719 |
| Citation statistics |
Cited Times:4[CSCD]
[CSCD Record]
|
| Document Type | 期刊论文 |
| Identifier | http://ir.imr.ac.cn/handle/321006/148213 |
| Collection | 中国科学院金属研究所 |
| Affiliation | 中国科学院金属研究所 |
| Recommended Citation GB/T 7714 | 李文,冷文华,牛振江,等. 含氟水溶液中电化学刻蚀氟化WO3薄膜电极增强可见光光电化学性能[J]. 物理化学学报,2009,000(012):2427-2432. |
| APA | 李文.,冷文华.,牛振江.,李想.,费会.,...&曹楚南.(2009).含氟水溶液中电化学刻蚀氟化WO3薄膜电极增强可见光光电化学性能.物理化学学报,000(012),2427-2432. |
| MLA | 李文,et al."含氟水溶液中电化学刻蚀氟化WO3薄膜电极增强可见光光电化学性能".物理化学学报 000.012(2009):2427-2432. |
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