Alternative TitleEnhanced Photoelectrochemical Performance of WO3 Film Electrode under Visible Light by Electrochemical Etching Fluorination in Aqueous Solutions Containing Fluorine
李文; 冷文华; 牛振江; 李想; 费会; 张鉴清; 曹楚南
Source Publication物理化学学报
Other AbstractA new and simple method of electrochemical etching in acidic aqueous solutions containing fluorine for the electrodeposited WO3 thin films is presented.The samples were characterized by photoelectrochemistry,scanning electron microscopy(SEM),X-ray diffraction(XRD),X-ray photoelectron spectroscopy(XPS),UV-Vis diffuse reflectance spectroscopy,and photoluminescence(PL).Results showed that the etching increased the specific surface area with a concomitant reduction in the catalyst mass and also a change in the surface status of the electrodes.This modification of the surface status improved the photoelectrochemical performance of the electrodes under visible and UV-Vis light illumination with the same mass and specific surface area.This enhancement can be ascribed to the surface fluorination of the electrodes,which result in a decrease in the surface recombination centers and a negative shift in the flatband potential.The light absorption and crystalline were found to be unchanged by etching.The etched WO3 film electrode shows excellent photoelectrochemical stability in acid solutions.This provides a novel method for increasing thephoton electric conversion efficiency of WO3 thin film electrodes.
KeywordWO3 电化学刻蚀 氟化 光电化学 可见光
Indexed ByCSCD
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Cited Times:4[CSCD]   [CSCD Record]
Document Type期刊论文
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GB/T 7714
李文,冷文华,牛振江,等. 含氟水溶液中电化学刻蚀氟化WO3薄膜电极增强可见光光电化学性能[J]. 物理化学学报,2009,000(012):2427-2432.
APA 李文.,冷文华.,牛振江.,李想.,费会.,...&曹楚南.(2009).含氟水溶液中电化学刻蚀氟化WO3薄膜电极增强可见光光电化学性能.物理化学学报,000(012),2427-2432.
MLA 李文,et al."含氟水溶液中电化学刻蚀氟化WO3薄膜电极增强可见光光电化学性能".物理化学学报 000.012(2009):2427-2432.
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