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管道热丝CVC金刚石膜反应器温度场的数值计算
Alternative TitleNumerical Study on the Temperature Field of Reactor Wall for HFCVD Diamond Films
汪爱英; 纪爱玲; 邹友生; 孙超; 黄荣芳; 闻立时
2002
Source Publication人工晶体学报
ISSN1000-985X
Volume31Issue:6Pages:576-582
Abstract在热丝化学气相沉积(HFCVD)金刚石膜的传统管道反应器中,对不同传热机制下管道壁温度场的空间分布进行了模拟计算。结果表明,管道壁温度场在纯热辐射机制作用下的分布很不均匀;在绝热和恒温的边界条件下考虑热传导作用后,管道壁温度分布的均匀性大大提高;进一步的热对流作用仅提高管道壁的总体温度,并不显著改变管道壁温度场的均匀性分布。
Keyword热丝化学气相沉积 金刚石膜 温度场 模拟计算
Indexed ByCSCD
Language中文
CSCD IDCSCD:1016529
Citation statistics
Cited Times:1[CSCD]   [CSCD Record]
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/153136
Collection中国科学院金属研究所
Affiliation中国科学院金属研究所
Recommended Citation
GB/T 7714
汪爱英,纪爱玲,邹友生,等. 管道热丝CVC金刚石膜反应器温度场的数值计算[J]. 人工晶体学报,2002,31(6):576-582.
APA 汪爱英,纪爱玲,邹友生,孙超,黄荣芳,&闻立时.(2002).管道热丝CVC金刚石膜反应器温度场的数值计算.人工晶体学报,31(6),576-582.
MLA 汪爱英,et al."管道热丝CVC金刚石膜反应器温度场的数值计算".人工晶体学报 31.6(2002):576-582.
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