| SiO2薄膜改善Ti6Al4V合金恒温氧化行为的研究 | |
| Alternative Title | INFLUENCE OF SiO2 FILM ON ISOTHERMAL OXIDATION BEHAVIOR OF Ti6Al4V ALLOYS |
| 于存贞; 魏德洲; 朱圣龙 | |
| 2007 | |
| Source Publication | 腐蚀科学与防护技术
 |
| ISSN | 1002-6495 |
| Volume | 19.0Issue:002Pages:95-97 |
| Abstract | 介绍了用溶胶-凝胶/表面活性剂模板/添加剂的方法制备的SiO2薄膜对Ti6Al4V合金恒温氧化性能的影响.恒温氧化实验结果表明,制备的SiO2薄膜具有良好的抗恒温氧化性能.涂覆薄膜的试样表面形成了较薄的混合氧化膜.机理分析认为,该混合氧化物膜的生长机制由向内扩散的氧元素和向外扩散的金属元素控制. |
| Other Abstract | SiO2 thin films have been deposited on a Ti6Al4V based alloy by sol-gel processing using cetyltrimethylammonium bromide surfactant as a template and glycol as an additive. Isothermal oxidation test results show that the oxidation rates of the silica coated specimens were decreased significantly. A thick rutile titania layer, separated from the substrate by a thin alumina layer, formed beneath the silica film. An alumina layer,which contained a minor amount of titania,formed above the silica film. It is deduced therefore that the growth of the multilayered and mixed oxide scales was dominated by both outward diffusion of metal and inward diffusion of oxygen. |
| Keyword | 溶胶凝胶法 SiO2薄膜 Ti6Al4V合金 恒温氧化 |
| Indexed By | CSCD |
| Language | 中文 |
| CSCD ID | CSCD:2723398 |
| Citation statistics |
Cited Times:1[CSCD]
[CSCD Record]
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| Document Type | 期刊论文 |
| Identifier | http://ir.imr.ac.cn/handle/321006/153668 |
| Collection | 中国科学院金属研究所 |
| Affiliation | 中国科学院金属研究所 |
| Recommended Citation GB/T 7714 | 于存贞,魏德洲,朱圣龙. SiO2薄膜改善Ti6Al4V合金恒温氧化行为的研究[J]. 腐蚀科学与防护技术,2007,19.0(002):95-97. |
| APA | 于存贞,魏德洲,&朱圣龙.(2007).SiO2薄膜改善Ti6Al4V合金恒温氧化行为的研究.腐蚀科学与防护技术,19.0(002),95-97. |
| MLA | 于存贞,et al."SiO2薄膜改善Ti6Al4V合金恒温氧化行为的研究".腐蚀科学与防护技术 19.0.002(2007):95-97. |
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