Al2O3陶瓷表面的准分子激光活化沉积金属Cu技术

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	Al2O3陶瓷表面的准分子激光活化沉积金属Cu技术
	武颖娜; 梁勇; 冯钟潮
	2000
Source Publication	激光杂志
ISSN	0253-2743
Volume	21.0 Issue:005 Pages:43-44
Abstract	本文研究了通过ＸｅＣｌ准分子激光照射Ａｌ２Ｏ３陶瓷表面后，使其表面沉积金属Ｃｕ的技术，实验结果表明，Ａｌ２Ｏ３试样浸入Ｃｕ２ＳＯ４溶液后，金属Ｃｕ膜只沉积于激光照射区。经准分子激光照射，Ａｌ２Ｏ３表面结构的变化和Ａｌ富集区的产生是金属Ｃｕ沉积的主要原因。
Keyword	准分子激光铜膜陶瓷氧化铝表面活化沉积
Indexed By	CSCD
Language	中文
CSCD ID	CSCD:658862
Citation statistics	Cited Times:1[CSCD] [CSCD Record]
Document Type	期刊论文
Identifier	http://ir.imr.ac.cn/handle/321006/154789
Collection	中国科学院金属研究所
Affiliation	中国科学院金属研究所
Recommended Citation GB/T 7714	武颖娜,梁勇,冯钟潮. Al2O3陶瓷表面的准分子激光活化沉积金属Cu技术[J]. 激光杂志,2000,21.0(005):43-44.
APA	武颖娜,梁勇,&冯钟潮.(2000).Al2O3陶瓷表面的准分子激光活化沉积金属Cu技术.激光杂志,21.0(005),43-44.
MLA	武颖娜,et al."Al2O3陶瓷表面的准分子激光活化沉积金属Cu技术".激光杂志 21.0.005(2000):43-44.

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