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氮气分压对电弧离子镀CrNx薄膜组织结构的影响
Alternative TitleNitrogen Partial Pressure and Microstructures of CrNx Coating by Arc Ion Plating
陈康敏; 张晓柠; 郑陈超; 黄燕; 关庆丰; 宫磊; 孙超
2010
Source Publication真空科学与技术学报
ISSN1672-7126
Volume30.0Issue:006Pages:662-666
Abstract利用电弧离子镀技术在钛合金表面制备CrNx薄膜,分析讨论氮气分压对薄膜表面形貌、相组成和微观结构的影响。结果表明,随着氮气分压的升高,CrNx薄膜表面熔滴的数量及尺寸减少,表面平整度得到明显改善;薄膜的物相组成在氮气分压为1.0Pa时由Cr2N相变为CrN相;同时因氮气分压改变粒子、离子的轰击作用,影响薄膜表面的能量状态,CaNx薄膜晶体的择优生长由(200),(220)变为(111)。在氮气分压为1.5Pa时可获得高沉积效率、高致密度、高硬度,并具有纳米晶体结构的单相CrN薄膜。
Other AbstractThe CrNx coatings were deposited by arc ion plating on Ti-6Al-4V substrates.The impacts of the coating conditions,including the nitrogen partial pressure,deposition rate,duty cycle of the voltage pulse,on mechanical properties of the coating were evaluated.The microstructures of the coating were characterized with scanning electron microscopy,X-ray diffraction,and transmission electron microscopy.The results show that the nitrogen partial pressure significantly affects the surface morphologies,microstructures and mechanical properties of the CrNx coatings.For example,as the partial pressure rises up,the coating becomes increasingly smooth with decreased number and sizes of Cr droplets.At a 1.0 Pa of nitrogen,the Cr2N phase transited into CrN.Moreover,the partial pressure influenced the bombardment of charged particles and the electronic properties of the surface.At 1.5 Pa,CrN and a high deposition rate,highly compact,nanocrystal CrN films with high surface hardness can be grown.
Keyword电弧离子镀 CrNx薄膜 氮气分压 组织结构
Indexed ByCSCD
Language中文
CSCD IDCSCD:4052569
Citation statistics
Cited Times:8[CSCD]   [CSCD Record]
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/155559
Collection中国科学院金属研究所
Affiliation中国科学院金属研究所
Recommended Citation
GB/T 7714
陈康敏,张晓柠,郑陈超,等. 氮气分压对电弧离子镀CrNx薄膜组织结构的影响[J]. 真空科学与技术学报,2010,30.0(006):662-666.
APA 陈康敏.,张晓柠.,郑陈超.,黄燕.,关庆丰.,...&孙超.(2010).氮气分压对电弧离子镀CrNx薄膜组织结构的影响.真空科学与技术学报,30.0(006),662-666.
MLA 陈康敏,et al."氮气分压对电弧离子镀CrNx薄膜组织结构的影响".真空科学与技术学报 30.0.006(2010):662-666.
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