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ZnO:Al薄膜的组织结构与性能
裴志亮; 谭明晖; 杜昊; 陈猛; 孙超; 黄荣芳; 闻立时
2000
Source Publication材料研究学报
ISSN1005-3093
Volume14.0Issue:005Pages:538-542
Abstract用直流磁控反应溅射合金制备了ZnO薄膜,研究了衬底温度和退火温度对薄膜的结构及电学和光学性能的影响。衬底温度升高能改善薄膜的电学特性,其原因是薄膜晶粒尺寸的增大。温度升高导致薄膜基本光学吸收边向短波移动,但对高透射区(450~850nm)的透射率影响不大。
KeywordZnO薄膜 透射率 合金靶Al/Zn 组织结构 性能
Indexed ByCSCD
Language中文
CSCD IDCSCD:550927
Citation statistics
Cited Times:5[CSCD]   [CSCD Record]
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/156244
Collection中国科学院金属研究所
Affiliation中国科学院金属研究所
Recommended Citation
GB/T 7714
裴志亮,谭明晖,杜昊,等. ZnO:Al薄膜的组织结构与性能[J]. 材料研究学报,2000,14.0(005):538-542.
APA 裴志亮.,谭明晖.,杜昊.,陈猛.,孙超.,...&闻立时.(2000).ZnO:Al薄膜的组织结构与性能.材料研究学报,14.0(005),538-542.
MLA 裴志亮,et al."ZnO:Al薄膜的组织结构与性能".材料研究学报 14.0.005(2000):538-542.
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