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空蚀对20SiMn在3%NaCl溶液中的电化学腐蚀行为的影响
骆素珍; 郑玉贵; 敬和民; 姚治铭; 柯伟
2003
Source Publication腐蚀科学与防护技术
ISSN1002-6495
Volume15.0Issue:006Pages:311-314
Abstract利用带电化学测试系统的磁致伸缩空蚀试验机研究了20SiMn低合金钢在3%NaCl水溶液中的电化学腐蚀行为。通过空蚀和静态条件下的自腐蚀电位变化以及交流阻抗谱和动电位极化曲线的比较,分析了空蚀加速20SiMn低合金钢电化学腐蚀的机理.结果表明,空蚀使20SiMn低合金钢的自腐蚀电位正移200mV,并显著降低电荷转移电阻和线性极化电阻,使电化学腐蚀速率增大约54倍;随着空蚀的进行,电荷转移电阻和线性极化电阻减小,空蚀3h后逐渐趋于稳定。
Keyword空蚀 20SiMn 电化学腐蚀 低合金钢 阻抗谱 极化曲线
Indexed ByCSCD
Language中文
CSCD IDCSCD:1198878
Citation statistics
Cited Times:4[CSCD]   [CSCD Record]
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/156461
Collection中国科学院金属研究所
Affiliation中国科学院金属研究所
Recommended Citation
GB/T 7714
骆素珍,郑玉贵,敬和民,等. 空蚀对20SiMn在3%NaCl溶液中的电化学腐蚀行为的影响[J]. 腐蚀科学与防护技术,2003,15.0(006):311-314.
APA 骆素珍,郑玉贵,敬和民,姚治铭,&柯伟.(2003).空蚀对20SiMn在3%NaCl溶液中的电化学腐蚀行为的影响.腐蚀科学与防护技术,15.0(006),311-314.
MLA 骆素珍,et al."空蚀对20SiMn在3%NaCl溶液中的电化学腐蚀行为的影响".腐蚀科学与防护技术 15.0.006(2003):311-314.
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