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Study the existing form of copper (p-type oxide/segregation) and its release mechanism from the passive film of Ti-7Cu alloy
Siddiqui, Muhammad Ali1,2,3; Ullah, Ihsan1,2; Kolawole, Sharafadeen Kunle1,2; Peng, Cong1,2; Wang, Jiewen1,2; Ren, Ling1; Yang, Ke1; Macdonald, Digby D.4
Corresponding AuthorRen, Ling(lren@imr.ac.cn) ; Macdonald, Digby D.(macdonald@berkeley.edu)
2021-09-01
Source PublicationCORROSION SCIENCE
ISSN0010-938X
Volume190Pages:14
AbstractThe existing form of copper and its release mechanism from the passive film of Ti-7Cu alloy was studied by Quantitative analysis of depth profile and series of electrochemical tests. Results were interpreted within the Point Defect Model-II. Copper does not form any p-type (cuprous or cupric) oxide but preferentially oxidises at the metal/film interface and segregated as Cu interstitials (Cu-i(+)) and become substituted as Cu-Ti(x') in the oxygen-deficient TiO2-x barrier layer having n-type semiconducting character. Eventually, the segregated species of Cu preferentially dissolute through the film as Cu ions into the solution at film/solution interface via the Esaki-tunnelling effect.
KeywordTi-7Cu Electrochemical Segregation of Cu in the passive film Point defect model Quantitative analysis ARXPS
Funding OrganizationNational Key Research and Development Program of China ; LiaoNing Revitalization Talents Program ; National Natural Science Foundation ; CSC scholarship ; FUTURE (Fundamental Understanding of Transport Uunder Reactor Extremes) ; U.S. Department of Energy (DOE), Office of Science, Basic Energy Sciences (BES)
DOI10.1016/j.corsci.2021.109693
Indexed BySCI
Language英语
Funding ProjectNational Key Research and Development Program of China[2018YFC1106601] ; LiaoNing Revitalization Talents Program[XLYC1807069] ; National Natural Science Foundation[51631009] ; National Natural Science Foundation[31870954] ; CSC scholarship ; FUTURE (Fundamental Understanding of Transport Uunder Reactor Extremes) ; U.S. Department of Energy (DOE), Office of Science, Basic Energy Sciences (BES)
WOS Research AreaMaterials Science ; Metallurgy & Metallurgical Engineering
WOS SubjectMaterials Science, Multidisciplinary ; Metallurgy & Metallurgical Engineering
WOS IDWOS:000686173200004
PublisherPERGAMON-ELSEVIER SCIENCE LTD
Citation statistics
Cited Times:19[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/159251
Collection中国科学院金属研究所
Corresponding AuthorRen, Ling; Macdonald, Digby D.
Affiliation1.Chinese Acad Sci, Inst Met Res, 72 Wenhua Rd, Shenyang 110016, Peoples R China
2.Univ Sci & Technol China, Sch Mat Sci & Engn, 96 Jinzhai Rd, Hefei 230026, Peoples R China
3.NED Univ Engn & Technol, Dept Met Engn, Univ Rd, Karachi 75270, Pakistan
4.Univ Calif Berkeley, Dept Nucl Engn, Berkeley, CA 94720 USA
Recommended Citation
GB/T 7714
Siddiqui, Muhammad Ali,Ullah, Ihsan,Kolawole, Sharafadeen Kunle,et al. Study the existing form of copper (p-type oxide/segregation) and its release mechanism from the passive film of Ti-7Cu alloy[J]. CORROSION SCIENCE,2021,190:14.
APA Siddiqui, Muhammad Ali.,Ullah, Ihsan.,Kolawole, Sharafadeen Kunle.,Peng, Cong.,Wang, Jiewen.,...&Macdonald, Digby D..(2021).Study the existing form of copper (p-type oxide/segregation) and its release mechanism from the passive film of Ti-7Cu alloy.CORROSION SCIENCE,190,14.
MLA Siddiqui, Muhammad Ali,et al."Study the existing form of copper (p-type oxide/segregation) and its release mechanism from the passive film of Ti-7Cu alloy".CORROSION SCIENCE 190(2021):14.
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